In this paper, we investigate the effect of annealing temperature on structural, optical, and photocatalytic properties of nanostructured ZnTiO3 thin films deposited on Si substrates. ZnTiO3 coatings were prepared by consecutive sol-gel method and further deposited on Si substrates by spin-coating. The obtained films were annealed at three various temperatures namely 700 °C, 800 °C, and 900 °C. X-ray diffraction analysis shows that the crystallite size of the films grows from 100 to 125 nm as the annealing temperature increases from 700 to 900 °C. At the same time, the roughness increases from 232 to 289 nm and the band gap dwindles from 3.73 to 3.05 eV. ZnTiO3 coatings annealed at 700 °C exhibits the highest photodegradation rate about 74 % to catalyze the degradation of the Methylene Blue aqueous solution. We demonstrate that this high photocatalytic activity is attributed to the structural and optical properties of prepared samples.

中文翻译：

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退火温度对用于光催化应用的硅上沉积的 ZnTiO3 钙钛矿层的结构和光学性能的影响

在本文中，我们研究了退火温度对沉积在 Si 衬底上的纳米结构 ZnTiO3 薄膜的结构、光学和光催化性能的影响。通过连续溶胶-凝胶法制备ZnTiO3涂层，并通过旋涂进一步沉积在Si衬底上。获得的薄膜在三个不同的温度下退火，即 700°C、800°C 和 900°C。X 射线衍射分析表明，随着退火温度从 700°C 增加到 900°C，薄膜的微晶尺寸从 100 nm 增长到 125 nm。同时，粗糙度从 232 nm 增加到 289 nm，带隙从 3.73 eV 减小到 3.05 eV。在 700 °C 下退火的 ZnTiO3 涂层表现出最高的光降解率，约为 74%，可催化亚甲蓝水溶液的降解。