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Cold Atmospheric Pressure Microplasma Pipette for Disinfection of Methicillin-Resistant Staphylococcus aureus
Micromachines ( IF 3.0 ) Pub Date : 2021-09-14 , DOI: 10.3390/mi12091103
Geunyoung Nam 1 , Muhwan Kim 2 , Yeonsook Jang 2 , Sungbo Cho 1, 3
Affiliation  

Microbial infections should be controlled and prevented for successful wound healing and tissue regeneration. Various disinfection methods exist that use antibiotics, ultraviolet (UV), heat, radiation, or chemical disinfectants; however, cold atmospheric pressure plasma has exhibited a unique and effective antibacterial ability that is not affected by antibiotic resistance or pain. This study develops a cold atmospheric pressure microplasma pipette (CAPMP) that outputs an Ar plasma plume through a tube with an inner radius of 180 μm for disinfection in a small area. The CAPMP was evaluated using Staphylococcus aureus and methicillin-resistant Staphylococcus aureus diluted in liquid media, spread on solid agar, or covered by dressing gauze. An increase in the treatment time of CAPMP resulted in a decrease in the number of colonies of the grown microorganism (colony forming unit) and an increase in the disinfected area for both bacteria. The disinfection ability of CAPMP was observed when the bacteria were covered with dressing gauze and was dependent on the number of gauze layers.

中文翻译:


冷常压微等离子体移液器用于耐甲氧西林金黄色葡萄球菌的消毒



应控制和预防微生物感染,以确保伤口成功愈合和组织再生。存在多种使用抗生素、紫外线 (UV)、热、辐射或化学消毒剂的消毒方法;然而,冷常压等离子体表现出独特而有效的抗菌能力,不受抗生素耐药性或疼痛的影响。本研究开发了一种冷常压微等离子体移液器(CAPMP),通过内半径为 180 μm 的管输出 Ar 等离子体羽流,用于小区域消毒。使用金黄色葡萄球菌和耐甲氧西林金黄色葡萄球菌在液体培养基中稀释、涂在固体琼脂上或用敷料纱布覆盖来评估 CAPMP。 CAPMP 处理时间的增加导致生长的微生物的菌落数量(菌落形成单位)减少,并且两种细菌的​​消毒面积增加。当细菌被敷料纱布覆盖时,观察CAPMP的消毒能力,并且取决于纱布层数。
更新日期:2021-09-14
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