Cu-graphene (Gr) composite thin films were prepared by electrodeposition route using in-house synthesized Gr sheets. The Gr sheets were synthesized by the electrochemical exfoliation route using 1 M HClO₄ acid as electrolyte. The Gr sheets were confirmed by X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR), field-emission scanning electron microscopy (FESEM), and transmission electron microscopy (TEM). The (002) plane of Gr sheets was observed at 2θ of 25.66°. The (002) plane confirmed the crystal structure of carbon peaks. The stretching vibration of C-C bond at a wavelength of 1577 cm⁻¹ and other functional groups of carboxyl and epoxide groups were observed from FTIR. TEM confirmed the transparent structure of Gr sheets. The prepared Gr sheets were used as reinforcement at concentrations of 0.1 and 0.3 g/L with a copper matrix to synthesize the Cu-Gr composite. The prepared composite thin films were characterized by XRD, SEM, and energy-dispersion spectrometry (EDS) for morphological and analytical studies. The presence of Gr sheets in Cu-Gr composite was confirmed by EDS analysis. The prepared Cu-Gr nanocomposite thin film showed higher corrosion resistance compared with pure copper thin films in 3.5wt% NaCl, as confirmed by Tafel plots. Electrochemical impedance spectroscopy complimented the above results and showed that 0.3 g/L composite film achieved the highest film resistance.

Cu-石墨烯 (Gr) 复合薄膜是使用内部合成的 Gr 片通过电沉积途径制备的。Gr 片是通过电化学剥离路线合成的，使用 1 M HClO ₄酸作为电解质。通过 X 射线衍射 (XRD)、傅里叶变换红外光谱 (FTIR)、场发射扫描电子显微镜 (FESEM) 和透射电子显微镜 (TEM) 证实了 Gr 片。在2中观察到的Gr片的（002）面θ 25.66°。(002) 平面证实了碳峰的晶体结构。CC键在1577 cm ^-1波长处的伸缩振动从 FTIR 观察到羧基和环氧基的其他官能团。TEM 证实了 Gr 片的透明结构。将制备的 Gr 片用作铜基体浓度为 0.1 和 0.3 g/L 的增强材料，以合成 Cu-Gr 复合材料。制备的复合薄膜通过 XRD、SEM 和能量色散光谱 (EDS) 进行表征，用于形态学和分析研究。通过 EDS 分析证实了 Cu-Gr 复合材料中 Gr 片的存在。Tafel 图证实，与纯铜薄膜相比，在 3.5wt% NaCl 中制备的 Cu-Gr 纳米复合薄膜具有更高的耐腐蚀性。电化学阻抗谱补充了上述结果，表明 0.3 g/L 的复合膜达到了最高的膜电阻。