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Generic model of time-variant tool influence function and dwell-time algorithm for deterministic polishing
International Journal of Mechanical Sciences ( IF 7.1 ) Pub Date : 2021-09-10 , DOI: 10.1016/j.ijmecsci.2021.106795
Jiong Zhang 1 , Hao Wang 1
Affiliation  

In computer-controlled optical surfacing (CCOS) techniques, the tool influence function (TIF) is generally assumed to be time-invariant; thus, two-dimensional convolution can be employed to compute the dwell time. However, the material removal rate is time-variant in some CCOS processes. This time-variant material removal rate makes it difficult to accurately model the TIF and impracticality of the two-dimensional convolution algorithm. We herein establish a novel modelling framework of the TIF considering the time-variant material removal rate in CCOS based on a partial differential equation. An updated dwell-time algorithm is also proposed to address the inverse problem of freeform surface generation by using the established TIF. The proposed modelling technique is well demonstrated in magnetically driven internal finishing and abrasive jet machining. The results demonstrate that the model can precisely predict the polished profile against the polishing time, and the novel dwell-time algorithm outperforms the conventional convolution algorithm in terms of efficiency and accuracy. The modelling framework enables localised freeform surface generation and corrective polishing on internal surfaces. The proposed TIF model and dwell-time algorithm may be extended to other CCOS techniques to achieve better figuring accuracy, such as bonnet polishing, ion beam figuring, and plasma jet machining.



中文翻译:

用于确定性抛光的时变工具影响函数和停留时间算法的通用模型

在计算机控制的光学表面处理 (CCOS) 技术中,工具影响函数 (TIF) 通常被假定为时不变的;因此,可以使用二维卷积来计算停留时间。然而,在某些 CCOS 工艺中,材料去除率是随时间变化的。这种随时间变化的材料去除率使得二维卷积算法的 TIF 难以准确建模和不切实际。在此,我们基于偏微分方程建立了考虑 CCOS 中随时间变化的材料去除率的 TIF 的新建模框架。还提出了一种更新的停留时间算法,以通过使用已建立的 TIF 来解决自由曲面生成的逆问题。所提出的建模技术在磁驱动内部精加工和磨料喷射加工中得到了很好的证明。结果表明,该模型可以根据抛光时间精确预测抛光轮廓,并且新的停留时间算法在效率和准确性方面优于传统的卷积算法。建模框架支持局部自由曲面生成和内表面校正抛光。提出的 TIF 模型和停留时间算法可以扩展到其他 CCOS 技术,以实现更好的加工精度,例如阀盖抛光、离子束加工和等离子射流加工。新的停留时间算法在效率和准确性方面优于传统的卷积算法。建模框架支持局部自由曲面生成和内表面校正抛光。提出的 TIF 模型和停留时间算法可以扩展到其他 CCOS 技术,以实现更好的加工精度,例如阀盖抛光、离子束加工和等离子射流加工。新的停留时间算法在效率和准确性方面优于传统的卷积算法。建模框架支持局部自由曲面生成和内表面校正抛光。提出的 TIF 模型和停留时间算法可以扩展到其他 CCOS 技术,以实现更好的加工精度,例如阀盖抛光、离子束加工和等离子射流加工。

更新日期:2021-09-12
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