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Passivating Contact with Phosphorus-Doped Polycrystalline Silicon-Nitride with an Excellent Implied Open-Circuit Voltage of 745 mV and Its Application in 23.88% Efficiency TOPCon Solar Cells
Solar RRL ( IF 7.9 ) Pub Date : 2021-09-12 , DOI: 10.1002/solr.202100644 Qing Yang 1, 2, 3 , Zunke Liu 1, 2 , Yiran Lin 1 , Wei Liu 1 , Mingdun Liao 1 , Mengmeng Feng 1 , Yuyan Zhi 1 , Jingming Zheng 1 , Linna Lu 1 , Dian Ma 1 , Qingling Han 1 , Hao Cheng 1 , Zhenhai Yang 1 , Kaining Ding 3 , Weiyuan Duan 3 , Hui Chen 4 , Yuming Wang 4 , Yuheng Zeng 1 , Baojie Yan 1 , Jichun Ye 1
Solar RRL ( IF 7.9 ) Pub Date : 2021-09-12 , DOI: 10.1002/solr.202100644 Qing Yang 1, 2, 3 , Zunke Liu 1, 2 , Yiran Lin 1 , Wei Liu 1 , Mingdun Liao 1 , Mengmeng Feng 1 , Yuyan Zhi 1 , Jingming Zheng 1 , Linna Lu 1 , Dian Ma 1 , Qingling Han 1 , Hao Cheng 1 , Zhenhai Yang 1 , Kaining Ding 3 , Weiyuan Duan 3 , Hui Chen 4 , Yuming Wang 4 , Yuheng Zeng 1 , Baojie Yan 1 , Jichun Ye 1
Affiliation
A P-doped polycrystalline silicon-nitride (n-poly-SiN
x
) as the electron selective collection layer in a tunnel oxide passivated contact (TOPCon) solar cell is reported. The nitrogen content is controlled by the active gas ratio of R = NH3/(SiH4 + NH3) during the plasma-enhanced chemical vapor deposition (PECVD) process. The effects of R ratio on the material's composition, crystallinity, surface passivation, and contact resistivity are investigated. The poly-SiN
x
contact exhibits improved surface passivation in comparison with the reference poly-Si without N incorporation. The best double-sided passivated n-type alkaline-polished crystalline silicon wafer with the n-poly-SiN
x
/SiO
x
manifests the highest implied open-circuit voltage (iV
oc) of ≈745 mV, with the corresponding single-sided saturated current density of 1.7 fA cm−2 and the effective lifetime (τ
eff) of 10 ms at the injection level of ≈1 × 1015 cm−3. In contrast, the controlled sample with an n-poly-Si/SiO
x
passivation contact has a maximal iV
oc of 738 mV. However, the primary drawback of the N doping is to raise the contact resistivity, but which is still in an acceptable range and shows little effect on the performance of solar cell with full-area contact. The proof-of-concept TOPCon solar cell using the n-poly-SiN
x
/SiO
x
passivating contact has achieved an efficiency of 23.88%, indicating the potential of the n-poly-SiN
x
for high-efficiency TOPCon solar cells.
中文翻译:
与磷掺杂多晶氮化硅的钝化接触具有 745 mV 的优异隐含开路电压及其在 23.88% 效率的 TOPCon 太阳能电池中的应用
报道了一种 P 掺杂的多晶氮化硅 (n-poly-SiN x ) 作为隧道氧化物钝化接触 (TOPCon) 太阳能电池中的电子选择收集层。在等离子体增强化学气相沉积 (PECVD) 工艺期间,氮含量由R = NH 3 /(SiH 4 + NH 3 )的活性气体比率控制。研究了R比对材料成分、结晶度、表面钝化和接触电阻率的影响。多晶SiN x 与未掺入 N 的参考多晶硅相比,接触显示出改善的表面钝化。具有 n-poly-SiN x /SiO x的最佳双面钝化 n 型碱抛光晶体硅片表现出最高的隐含开路电压 (i V oc ) ≈745 mV,相应的单面1.7 fA cm -2 的饱和电流密度和≈1 × 10 15 cm -3注入水平下 10 ms的有效寿命 ( τ eff ) 。相比之下,具有 n-poly-Si/SiO x钝化触点的受控样品具有最大 i V oc 738 mV。然而,N掺杂的主要缺点是提高了接触电阻率,但仍在可接受的范围内,对全面积接触太阳能电池的性能影响不大。使用 n-poly-SiN x /SiO x钝化触点的概念验证 TOPCon 太阳能电池实现了 23.88% 的效率,表明 n-poly-SiN x用于高效 TOPCon 太阳能电池的潜力。
更新日期:2021-11-04
中文翻译:
与磷掺杂多晶氮化硅的钝化接触具有 745 mV 的优异隐含开路电压及其在 23.88% 效率的 TOPCon 太阳能电池中的应用
报道了一种 P 掺杂的多晶氮化硅 (n-poly-SiN x ) 作为隧道氧化物钝化接触 (TOPCon) 太阳能电池中的电子选择收集层。在等离子体增强化学气相沉积 (PECVD) 工艺期间,氮含量由R = NH 3 /(SiH 4 + NH 3 )的活性气体比率控制。研究了R比对材料成分、结晶度、表面钝化和接触电阻率的影响。多晶SiN x 与未掺入 N 的参考多晶硅相比,接触显示出改善的表面钝化。具有 n-poly-SiN x /SiO x的最佳双面钝化 n 型碱抛光晶体硅片表现出最高的隐含开路电压 (i V oc ) ≈745 mV,相应的单面1.7 fA cm -2 的饱和电流密度和≈1 × 10 15 cm -3注入水平下 10 ms的有效寿命 ( τ eff ) 。相比之下,具有 n-poly-Si/SiO x钝化触点的受控样品具有最大 i V oc 738 mV。然而,N掺杂的主要缺点是提高了接触电阻率,但仍在可接受的范围内,对全面积接触太阳能电池的性能影响不大。使用 n-poly-SiN x /SiO x钝化触点的概念验证 TOPCon 太阳能电池实现了 23.88% 的效率,表明 n-poly-SiN x用于高效 TOPCon 太阳能电池的潜力。