Ink-Lithography for Property Engineering and Patterning of Nanocrystal Thin Films,ACS Nano

当前位置： X-MOL 学术 › ACS Nano › 论文详情

Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)

Ink-Lithography for Property Engineering and Patterning of Nanocrystal Thin Films
ACS Nano ( IF 15.8 ) Pub Date : 2021-09-08 , DOI: 10.1021/acsnano.1c04772
Junhyuk Ahn ₁ , Sanghyun Jeon ₁ , Ho Kun Woo ₁ , Junsung Bang ₁ , Yong Min Lee ₂ , Steven J Neuhaus ₃ , Woo Seok Lee ₁ , Taesung Park ₁ , Sang Yeop Lee ₁ , Byung Ku Jung ₁ , Hyungmok Joh ₁ , Mingi Seong ₁ , Ji-Hyuk Choi ₄ , Ho Gyu Yoon ₁ , Cherie R Kagan _{3,

5,

6} , Soong Ju Oh ₁

Affiliation

Next-generation devices and systems require the development and integration of advanced materials, the realization of which inevitably requires two separate processes: property engineering and patterning. Here, we report a one-step, ink-lithography technique to pattern and engineer the properties of thin films of colloidal nanocrystals that exploits their chemically addressable surface. Colloidal nanocrystals are deposited by solution-based methods to form thin films and a local chemical treatment is applied using an ink-printing technique to simultaneously modify (i) the chemical nature of the nanocrystal surface to allow thin-film patterning and (ii) the physical electronic, optical, thermal, and mechanical properties of the nanocrystal thin films. The ink-lithography technique is applied to the library of colloidal nanocrystals to engineer thin films of metals, semiconductors, and insulators on both rigid and flexible substrates and demonstrate their application in high-resolution image replications, anticounterfeit devices, multicolor filters, thin-film transistors and circuits, photoconductors, and wearable multisensors.

中文翻译：

用于纳米晶体薄膜的特性工程和图案化的油墨光刻

下一代设备和系统需要先进材料的开发和集成，其实现不可避免地需要两个独立的过程：属性工程和图案化。在这里，我们报告了一种一步法油墨光刻技术，用于图案化和设计利用其化学可寻址表面的胶体纳米晶体薄膜的特性。胶体纳米晶体通过基于溶液的方法沉积以形成薄膜，并使用油墨印刷技术进行局部化学处理，以同时修改 (i) 纳米晶体表面的化学性质以允许薄膜图案化和 (ii)纳米晶体薄膜的物理电子、光学、热和机械性能。

更新日期：2021-10-26

点击分享查看原文

点击收藏

阅读更多本刊最新论文本刊介绍/投稿指南11