Due to advancements in device scaling in very-large-scale integration (VLSI) technology, signal integrity (SI) issues play a major role to determining the performance of on-chip interconnects in high-speed digital circuits. The main SI issues are delays, peak voltage noise effects, crosstalk, and timing uncertainties. Here, the SI issues of the coupled multi-walled carbon nanotube (MWCNT) on-chip interconnects are evaluated with and without the effect of shielding technique and compared to the copper interconnects. The MWCNT exhibits an average of 47.9% smaller propagation delays than Cu in dynamic crosstalk conditions. Further, for crosstalk reduction, the active shielding (AS) and passive shielding (PS) techniques are proposed. With the AS and PS techniques, the MWCNT interconnects experience a decreased delay by 46.8% and 30.15% compared to without shielding technique, respectively. Moreover, the AS exhibits smaller crosstalk effects than the PS technique due to its input switching activities on shielded lines. In addition, the quality of the signal (QoS) and Intersymbol interference (ISI) noise effects of coupled MWCNT interconnect with and without shielding is evaluated. Finally, to improve the QoS and reduce the ISI effects, the decision feedback equalizer with the least mean square adaptive algorithm is implemented at the receiver end.

由于超大规模集成 (VLSI) 技术中器件缩放的进步，信号完整性 (SI) 问题在决定高速数字电路中的片上互连性能方面发挥着重要作用。主要的 SI 问题是延迟、峰值电压噪声影响、串扰和时序不确定性。在这里，耦合多壁碳纳米管 (MWCNT) 片上互连的 SI 问题在有和没有屏蔽技术的影响下进行了评估，并与铜互连进行了比较。在动态串扰条件下，MWCNT 的传播延迟平均比 Cu 小 47.9%。此外，为了减少串扰，提出了有源屏蔽 (AS) 和无源屏蔽 (PS) 技术。使用 AS 和 PS 技术，MWCNT 互连的延迟减少了 46.8% 和 30。与没有屏蔽技术相比，分别为 15%。此外，由于其在屏蔽线上的输入切换活动，AS 表现出比 PS 技术更小的串扰效应。此外，还评估了带屏蔽和不带屏蔽的耦合 MWCNT 互连的信号质量 (QoS) 和符号间干扰 (ISI) 噪声影响。最后，为了提高服务质量，减少ISI效应，在接收端实现了具有最小均方自适应算法的判决反馈均衡器。