This contribution places emphasis on tuning pore architecture and film thickness of mesoporous Pd–Cu–Si thin films sputtered on Si/SiO₂ substrates for enhanced electrocatalytic and hydrogen sorption/desorption activity and their comparison with the state-of-the-art thin film electrocatalysts. Small Tafel slope of 43 mV dec^–1 for 1250 nm thick coating on 2 µm diameter pores with 4.2 µm interspacing electrocatalyst with comparable hydrogen overpotentials to the literature suggests its use for standard fuel cells. The largest hydrogen sorption has been attained for the 250 nm thick electrocatalyst on 5 µm pore diameter with 12 µm interspacing (2189 µC cm⁻² per CV cycle), making it possible for rapid storage systems. Moreover, the charge transfer resistance described by an equivalent circuit model has an excellent correlation with Tafel slopes. Along with its very low Tafel slope of 42 mV dec^–1 10 nm thick electrocatalyst on 2 µm diameter pores with 4.2 µm interspacing has the highest capacitive response of ∼ 0.001 S sⁿ cm⁻² and is promising to be used as a nano-charger and hydrogen sensor. The findings of Si/SiO₂ supported mesoporous Pd-based metallic glass (MG) assemblies suggest a similar design applicability for crystalline systems and other MG types.

这一贡献强调调整溅射在 Si/SiO ₂衬底上的介孔 Pd-Cu-Si 薄膜的孔结构和膜厚度，以增强电催化和氢吸附/解吸活性，以及​​它们与最先进薄膜的比较电催化剂。43 mV dec ^{–1 的}小 Tafel 斜率对于 1250 nm 厚的涂层，在 2 µm 直径的孔上具有 4.2 µm 的间距电催化剂，其氢超电势与文献相当，表明其可用于标准燃料电池。250 nm 厚的电催化剂在 5 µm 孔径和 12 µm 间距（2189 µC cm ^-2每个 CV 周期），使快速存储系统成为可能。此外，等效电路模型描述的电荷转移电阻与 Tafel 斜率具有极好的相关性。除了其非常低的 Tafel 斜率 42 mV dec ^–1 10 nm 厚的电催化剂在 2 µm 直径的孔上，4.2 µm 间距具有最高的电容响应，约为 0.001 S s ⁿ cm ^-2并且有望用作纳米级充电器和氢气传感器。Si/SiO ₂支持的介孔 Pd 基金属玻璃 (MG) 组件的发现表明类似的设计适用于晶体系统和其他 MG 类型。