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Heteroepitaxy of single crystal diamond on Ir buffered KTaO3(001) substrates
Applied Physics Letters ( IF 4 ) Pub Date : 2021-09-03 , DOI: 10.1063/5.0045886
Qiang Wei 1 , Gang Niu 2 , Ruozheng Wang 1 , Genqiang Chen 1 , Fang Lin 1 , Xiaofan Zhang 1 , Zhaoyang Zhang 1 , Hong-Xing Wang 1
Affiliation  

The heteroepitaxy of a single crystal diamond has been carried out in the KTaO3 substrate using Ir as a buffer layer. KTaO3 has a perovskite lattice structure and displays a face-centered cubic structure. Its lattice constant is 3.98 Å, which is only 3% mismatched with the lattice constant of Ir of 3.84 Å, and also, its thermal expansion coefficient is 4.031 × 10−6/K, which is nearly close to that of diamond 3.85 × 10−6/K (at 1223 K), making it to be regarded as an alternate substrate of the heteroepitaxy of a single crystal diamond. The magnetron sputtering technique was used to deposit Ir thin films with a high orientation in the (001) direction on a KTaO3 (001) substrate. Thereafter, bias enhanced nucleation on Ir surface was grown by direct current chemical vapor deposition (CVD) methods. At last, a single crystal diamond with a size of 10 × 10 × 0.78 mm3 has been grown, whose (004) rocking curve FWHM is 183 arc sec, which testifies to the excellent crystalline quality of the heteroepitaxial diamond film.

中文翻译:

单晶金刚石在 Ir 缓冲 KTaO3(001) 衬底上的异质外延

使用Ir作为缓冲层在KTaO 3衬底中进行了单晶金刚石的异质外延。KTaO 3具有钙钛矿晶格结构并显示出面心立方结构。它的晶格常数为 3.98 Å,与 Ir 的晶格常数 3.84 Å 仅相差 3%,并且其热膨胀系数为 4.031 × 10 -6 /K,接近于金刚石的 3.85 × 10 -6 /K(1223 K),使其被视为单晶金刚石异质外延的替代衬底。磁控溅射技术用于在 KTaO 3(001) 基材。此后,通过直流化学气相沉积 (CVD) 方法在 Ir 表面上生长了偏置增强的成核。最后生长出尺寸为10 × 10 × 0.78 mm 3 的单晶金刚石,其(004)摇摆曲线FWHM为183弧秒,证明了异质外延金刚石薄膜的优良结晶质量。
更新日期:2021-09-03
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