In this study, a novel and highly efficient isotropic etching polishing (IEP) technique electrochemically polished flat and complex 3D printed Inconel 718 (IN718) parts. The anisotropic etching was transformed into isotropic etching based on the electrolyte diffusion characteristics, and the latter was also realized as the polishing mechanism of 3D printed IN718. Wet etching revealed inhomogeneous microstructures in 3D printed IN718, which dissolved preferentially when polished for a longer duration. The initial surface roughness of 674 nm was reduced to 31.5 nm, and a maximum of 2.42 mm³/min material removal rate (MRR) was achieved that varied with IEP parameters. The IEP improved the corrosion resistance of 3D printed IN718 compared to the original and grounded substrates, but it was limited by the processing time. Contrarily, the surface mechanical properties of 3D printed IN718 were slightly degraded after IEP. Finally, the 3D printed IN718 complex parts were polished for 5 min, and the Sa roughness was reduced by 76 %, demonstrating a huge potential of IEP as a contemporary industrial polishing technique.

在这项研究中，一种新颖且高效的各向同性蚀刻抛光 (IEP) 技术电化学抛光平面和复杂的 3D 打印 Inconel 718 (IN718) 零件。基于电解液扩散特性将各向异性蚀刻转化为各向同性蚀刻，后者也作为3D打印IN718的抛光机制得以实现。湿法蚀刻显示 3D 打印的 IN718 中存在不均匀的微观结构，当抛光时间较长时，其优先溶解。初始表面粗糙度 674 nm 降低到 31.5 nm，最大为 2.42 mm ³/min 材料去除率 (MRR) 随 IEP 参数而变化。与原始和接地基板相比，IEP 提高了 3D 打印 IN718 的耐腐蚀性，但受到处理时间的限制。相反，IEP 后 3D 打印的 IN718 的表面机械性能略有下降。最后，将 3D 打印的 IN718 复杂零件抛光 5 分钟，Sa 粗糙度降低了 76%，展示了 IEP 作为当代工业抛光技术的巨大潜力。