当前位置: X-MOL 学术APL Photonics › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Accurate modeling and characterization of photothermal forces in optomechanics
APL Photonics ( IF 5.4 ) Pub Date : 2021-08-02 , DOI: 10.1063/5.0055201
André G. Primo 1, 2 , Cauê M. Kersul 1, 2 , Rodrigo Benevides 1, 2 , Natália C. Carvalho 1, 2 , Michaël Ménard 3 , Newton C. Frateschi 1, 2 , Pierre-Louis de Assis 1 , Gustavo S. Wiederhecker 1, 2 , Thiago P. Mayer Alegre 1, 2
Affiliation  

Photothermal effects have been pointed out as prominent sources of forces in optomechanical systems, competing with the standard radiation pressure interactions. In this article, we derive a novel and accurate model for the prediction of photothermal forces and establish how some previous proposals can be complemented to yield precise results. As a proof-of-concept, we perform numerical and experimental tests on GaAs microdisk cavities and obtain striking agreement with our framework, revealing the importance of considering surface photothermal forces and the effects of multiple thermal modes in microphotonic devices.

中文翻译:

光机械中光热力的精确建模和表征

光热效应已被指出是光机械系统中的主要力源,与标准的辐射压力相互作用竞争。在本文中,我们推导出了一种新颖且准确的光热力预测模型,并确定了如何补充之前的一些建议以产生精确的结果。作为概念验证,我们对 GaAs 微盘腔进行了数值和实验测试,并与我们的框架取得了惊人的一致,揭示了在微光子器件中考虑表面光热力和多种热模式影响的重要性。
更新日期:2021-08-31
down
wechat
bug