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Removal of Chlorinated Organic Pollutants from Groundwater Using a Vacuum-UV-Based Advanced Oxidation Process
ACS ES&T Water ( IF 4.8 ) Pub Date : 2021-08-31 , DOI: 10.1021/acsestwater.1c00167
Debra Barki 1 , Sara Sabach 1 , Yael Dubowski 1
Affiliation  

The presence of chlorinated organic compounds, such as trichlorethylene (TCE) and tetrachlorethylene (PCE), in water sources requires particular attention due to their slow rate of decomposition, carcinogenicity, and toxicity. Advanced oxidation processes (AOPs) have been addressed for treating such organic pollutants, most commonly using UV-C radiation (254 nm) with the addition of different chemicals (e.g., TiO2 and H2O2). Although these previous AOP studies were proven to be effective, chemical dosing often complicates the treatment process and increases its costs. The current study examines the removal kinetics of TCE and PCE under combined UV-C/vacuum-UV radiation in different water matrixes (distilled water, synthetic solutions, and real groundwater). Faster degradation of both pollutants and their transformation products were observed in the presence of vacuum-UV radiation (using Hg lamps emitting at 185 and 254 nm), with the most significant effect in distilled-water solutions. In more realistic water matrixes (groundwater), pollutants removal still occurred but at lower efficiency due to the presence of interfering compounds that react with the photogenerated hydroxyl radicals and/or absorb UV/vacuum-UV radiation. An investigation of the effect of such substances enabled to identify the main interfering compounds (e.g., carbonate system ions and chloride) and to develop an appropriate pretreatment for their removal, improving the treatment effectiveness.

中文翻译:

使用基于真空紫外线的高级氧化工艺去除地下水中的氯化有机污染物

水源中存在氯化有机化合物,如三氯乙烯 (TCE) 和四氯乙烯 (PCE),需要特别注意它们的分解速度慢、致癌性和毒性。高级氧化工艺 (AOP) 已用于处理此类有机污染物,最常见的是使用 UV-C 辐射(254 nm)并添加不同的化学品(例如,TiO 2和 H 2 O 2)。尽管这些先前的 AOP 研究被证明是有效的,但化学剂量通常会使处理过程复杂化并增加其成本。目前的研究检查了在不同水基质(蒸馏水、合成溶液和真实地下水)中,在组合 UV-C/真空-UV 辐射下 TCE 和 PCE 的去除动力学。在真空紫外辐射(使用发射波长为 185 和 254 nm 的汞灯)的情况下,观察到污染物及其转化产物的降解更快,在蒸馏水溶液中效果最显着。在更现实的水基质(地下水)中,污染物去除仍然发生但效率较低,因为存在与光生羟基自由基反应和/或吸收紫外线/真空-紫外线辐射的干扰化合物。
更新日期:2021-09-10
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