The oxidation of copper is essential for several fields, such as corrosion, catalytic methanol synthesis, and CO₂ electroreduction. However, the understanding of the oxidation of copper under various conditions is not complete. Here, we study the oxidation of the vicinal Cu(911) surface by O₂ with in-situ Surface X-ray Diffraction. It was found that the surface facets to (410), (401), and (100) which are stable in the parameter range of T = 25–400 °C and p = 10⁻¹⁰–10⁻⁵ mbar O₂. The (410) and (401) facets are present until the surface is further oxidized to Cu₂O, at 10⁻⁵ mbar and above. These results further the knowledge on the oxidation of copper and its surfaces, which may be of importance for a wide range of applications.

铜的氧化对于腐蚀、催化甲醇合成和CO ₂电还原等多个领域至关重要。然而，对铜在各种条件下的氧化作用的认识并不完整。在这里，我们用原位表面 X 射线衍射研究了 O ₂对邻位 Cu(911) 表面的氧化。发现表面刻面为 (410)、(401) 和 (100)，它们在T = 25–400 °C 和p  = 10 ^-10 –10 ^-5 mbar O ₂的参数范围内是稳定的。(410) 和 (401) 面一直存在，直到表面在 10 ^{-5 下}进一步氧化为 Cu ₂ O毫巴及以上。这些结果进一步加深了对铜及其表面氧化的了解，这对于广泛的应用可能很重要。