Abstract

The reactions of KI with the KF–KCl–K₂SiF₆ and KF–KCl–K₂SiF₆–SiO₂ salt systems are studied. The KF–KCl and KF–KCl–KI systems containing both K₂SiF₆ and SiO₂ are studied by Raman spectroscopy. The addition of KI to the KF–KCl–K₂SiF₆ and KF–KCl–K₂SiF₆–SiO₂ melts induces groups containing Si–I bonds in the molten solid samples. A significant portion of silicon dioxide from the KF–KCl–K₂SiF₆–SiO₂ and KF–KCl–KI–K₂SiF₆–SiO₂ melts crystallizes in the form of silicate structures characteristic of the K₂SiO₃ phase (K₂O·SiO₂). The results of Raman spectroscopy are consistent with the X-ray diffraction data for the KF–KCl and KF–KCl–KI melts containing both K₂SiF₆ and SiO₂. The crystallization field of K₃SiF₇ is retained upon the addition of KI to the KF–KCl–K₂SiF₆ and KF–KCl–K₂SiF₆–SiO₂ melts. KI introduced into the melt precipitates to form an individual phase during crystallization. Low-intensity peaks corresponding to the crystallization of the α-SiO₂ phase are detected for the KF–KCl–K₂SiF₆–SiO₂ and KF–KCl–KI–K₂SiF₆–SiO₂ systems. The KF–KCl–KI–K₂SiF₆ and KF–KCl–KI–K₂SiF₆–SiO₂ melts are studied by synchronous thermal analysis. Phase transitions probably associated with the transformation of \({\text{Si}}{{{\text{I}}}_{x}}{\text{F}}_{y}^{{z - }}\)-structures into structures containing \({\text{SiF}}_{6}^{{2 - }}\) are observed at temperatures up to 473 K, which is consistent with the data on the thermal stability of mixed silicon halides.

中文翻译：

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KI 对含有 K2SiF6 和 SiO2 的 KF-KCl 体系中反应的影响

摘要

研究了 KI 与 KF-KCl-K ₂ SiF ₆和 KF-KCl-K ₂ SiF ₆ -SiO ₂盐体系的反应。通过拉曼光谱研究了KF-KCl 和 KF-KCl-KI 系统，其中包含 K ₂ SiF ₆和 SiO ₂。向 KF-KCl-K ₂ SiF ₆和 KF-KCl-K ₂ SiF ₆ -SiO ₂熔体中添加 KI 会在熔融固体样品中诱导含有 Si-I 键的基团。来自 KF–KCl–K ₂ SiF ₆ –SiO ₂和 KF–KCl–KI–K _{2 的}大部分二氧化硅SiF ₆ –SiO ₂熔体以具有 K ₂ SiO ₃相 (K ₂ O·SiO ₂ )特征的硅酸盐结构形式结晶。拉曼光谱的结果与包含 K ₂ SiF ₆和 SiO ₂的 KF-KCl 和 KF-KCl-KI 熔体的 X 射线衍射数据一致。在 KF–KCl–K ₂ SiF ₆和 KF–KCl–K ₂ SiF ₆ –SiO _{2 中}加入 KI 后，K ₃ SiF ₇的结晶场得以保留融化。在结晶过程中引入熔体沉淀的 KI 形成单独的相。对于 KF–KCl–K ₂ SiF ₆ –SiO ₂和 KF–KCl–KI–K ₂ SiF ₆ –SiO ₂系统，检测到对应于 α-SiO ₂相结晶的低强度峰。KF-KCl-KI-K ₂ SiF ₆和KF-KCl-KI-K ₂ SiF ₆ -SiO ₂熔体通过同步热分析进行研究。相变可能与\({\text{Si}}{{{\text{I}}}_{x}}{\text{F}}_{y}^{{z - }} \)在高达 473 K 的温度下观察到含有\({\text{SiF}}_{6}^{{2 - }}\) 的结构，这与混合卤化硅的热稳定性数据一致.