Molecular films of octadecyltrichlorosilane (OTS) silanized on silicon substrates were obtained by a succession of fabrication steps consisting in plasma hydroxylation of silicon surface, formation of a water layer adsorbed on hydroxylated surface by substrate exposure to water vapor and OTS vapor deposition. All fabrication steps were realized in the same vacuum chamber to avoid surface contamination and to control the amount of water adsorbed on the hydroxylated surface. It is proved that the amount of water on the substrate surface plays a key role in fabrication of smooth OTS molecular films, large amounts of water on substrates resulting in formation of 3D OTS aggregates. The atomic force microscopy (AFM) investigations of the film surface revealed formation of liquid-expanded and liquid-condensed domains in OTS molecular films. Annealing of the OTS films promotes film dehydration, increases the film hydrophobicity and reduces nanoscopic adhesion and friction forces between silicon AFM tips and film surface.

在硅衬底上硅烷化的十八烷基三氯硅烷 (OTS) 的分子膜通过一系列制造步骤获得，包括硅表面的等离子体羟基化、通过衬底暴露于水蒸气和 OTS 气相沉积形成吸附在羟基化表面上的水层。所有制造步骤都在同一真空室中完成，以避免表面污染并控制吸附在羟基化表面上的水量。事实证明，基底表面的水量在制造光滑的 OTS 分子膜中起着关键作用，基底上的大量水导致 3D OTS 聚集体的形成。薄膜表面的原子力显微镜 (AFM) 研究揭示了 OTS 分子薄膜中液体膨胀和液体浓缩域的形成。