We extend the patterning capability of laser interference lithography (LIL) to fabricate complex two-dimensional quasicrystal lattices, superlattices, and Moiré lattices. Traditional interference lithography is typically used to create single-pitch linear gratings or simple square or hexagonal patterns. In this work, we demonstrate how using multiple exposures at various defined orientations and with different interference pitch values results in a cumulative surface pattern that encompasses a diverse group of complex lattice structures. We demonstrate the fabrication of quasicrystal lattices of symmetry order ranging from 2-fold to 22-fold by repeated exposure of a one-dimensional interference pattern over multiple fixed sample rotation angles. More complex superlattice structures are prepared by overlapping two-dimensional lattices at controlled offset angles. Overlapping interference patterns with different pitch values and at different offsets are used to create various sophisticated incommensurate Moiré lattices. The increasing complexity of these surfaces is determined using a numerical algorithm to predict their structure. The structure and optical diffraction of these lattices were measured and compared to model results. This work extends the capabilities of LIL to provide access to a wide variety of complex nanostructures with tunable periodicity and controllable symmetry. We anticipate that these structures will prove useful in the fabrication of surfaces and devices based upon periodic two-dimensional nanostructures, including photonic bandgap materials with tunable band gaps, as platforms for plasmonic devices with complex engineered structures, as novel diffractive optical elements, and as templates for controlling the self-assembly and crystallization of colloidal crystals.

中文翻译：

---

使用激光干涉光刻法创建二维准晶、超晶胞和莫尔晶格：对光子带隙材料的影响

我们扩展了激光干涉光刻 (LIL) 的图案化能力，以制造复杂的二维准晶格、超晶格和莫尔晶格。传统的干涉光刻通常用于创建单节距线性光栅或简单的方形或六边形图案。在这项工作中，我们展示了如何在各种定义的方向和不同的干涉间距值下使用多次曝光产生包含各种复杂晶格结构的累积表面图案。我们通过在多个固定的样品旋转角度重复曝光一维干涉图案，证明了对称阶次为 2 倍到 22 倍的准晶格的制造。通过以受控偏移角重叠二维晶格来制备更复杂的超晶格结构。具有不同间距值和不同偏移量的重叠干涉图案用于创建各种复杂的不公度莫尔晶格。这些表面日益增加的复杂性是通过使用数值算法来预测它们的结构来确定的。测量这些晶格的结构和光学衍射并与模型结果进行比较。这项工作扩展了 LIL 的能力，以提供对各种具有可调周期性和可控对称性的复杂纳米结构的访问。我们预计这些结构将被证明可用于制造基于周期性二维纳米结构的表面和器件，包括具有可调带隙的光子带隙材料，