The high entropy alloy coatings (HECs), as a breakthrough in the field of increasingly saturated traditional material, have broad development potential, but their applications are restricted by the shortcoming of preparation technology. In this paper, based on the multi-arc magnetic filter cathode vacuum arc system, which is equipped with a 120° Y-shaped magnetic filter duct that has the reasonable match between the geometric size of magnetic filter duct and the uniformity distribution of magnetic field intensity determined by finite element analysis and magnetic field design, the transport of multiple ions is real-time regulated by the relationship among the arc source, focusing magnetic field, the magnetic field of filter duct, arc discharge and ions transmission. Under the detailed process parameters of TiAlSi target arc current of 110 A, CrNi target arc current of 90 A, magnetic field current of 2 A, and negative bias voltage of 100 V, the AlCrNiTiSi HEC is prepared by the novel multi-arc magnetic filter cathode vacuum arc technology for the first time. The AlCrNiTiSi coatings deposited by this system are uniform and dense, and the components are uniformly distributed. The AlCrNiTiSi HEC has good hardness of 13.92 GPa and excellent corrosion resistance in 5 % H₂SO₄ of the minimum I_corr and I_p of 3.16 × 10⁻⁶ and 1.28 × 10⁻⁵ A•cm⁻².

高熵合金涂层（HECs）作为日益饱和的传统材料领域的突破，具有广阔的发展潜力，但其应用受到制备技术的不足限制。本文基于多弧磁过滤阴极真空电弧系统，配备120°Y形磁过滤管，使磁过滤管几何尺寸与磁场均匀分布合理匹配。通过有限元分析和磁场设计确定的强度，通过弧源、聚焦磁场、过滤管磁场、电弧放电和离子传输之间的关系实时调节多种离子的传输。在110 A的TiAlSi靶材电弧电流的详细工艺参数下，CrNi靶电弧电流90 A，磁场电流2 A，负偏压100 V，首次采用新型多弧磁过滤阴极真空电弧技术制备AlCrNiTiSi HEC。该系统沉积的AlCrNiTiSi涂层均匀致密，成分分布均匀。AlCrNiTiSi HEC 具有 13.92 GPa 的良好硬度和在 5 % H 下的出色耐腐蚀性₂ SO ₄的最小I _corr和I _p为3.16 × 10 ^-6和1.28 × 10 ^-5 A•cm ^-2。