Abstract

X-ray diffraction is used to investigate the texture and residual stresses in mono- and multilayer Nb, Mo, and Nb/Mo coatings. The (111) texture component and the level of residual compressive stresses are found to increase with the substrate voltage for ~10-μm-thick niobium and molybdenum monolayer coatings. The hexagonal Nb₂N nitride is found in the Nb coatings together with the bcc solid solution of nitrogen in niobium. The nitride content increases with the stress on the substrate. The level of residual compressive stresses in multilayer ~800-μm-thick coatings is significantly lower (200–600 MPa) than in much thinner (almost two orders of magnitude) monolayer coatings (>1000 MPa), which can be explained by the mutual compensation of thermal stresses with different signs at each following interface between niobium and molybdenum layers with significantly different linear thermal expansion coefficients (7.1 × 10^–6 and 5.3 × 10^–6 K^–1, respectively).

中文翻译：

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Mo、Nb 和 Nb/Mo 磁控管涂层的织构和残余应力

摘要

X 射线衍射用于研究单层和多层 Nb、Mo 和 Nb/Mo 涂层的织构和残余应力。对于~10-μm 厚的铌钼单层涂层，发现 (111) 织构分量和残余压应力水平随着基板电压的增加而增加。六角形 Nb ₂在 Nb 涂层中发现了 N 氮化物以及 N 在铌中的 bcc 固溶体。氮化物含量随着衬底上的应力而增加。多层~800 微米厚涂层的残余压应力水平（200-600 兆帕）明显低于更薄（几乎两个数量级）的单层涂层（>1000 兆帕），这可以通过相互在具有显着不同线性热膨胀系数（分别为 7.1 × 10 ^–6和 5.3 × 10 ^–6 K ^–1）的铌和钼层之间的每个后续界面处补偿具有不同符号的热应力。