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Optimization of a potential manufacturing process for thin-film LiCoO2 cathodes
Thin Solid Films ( IF 2.0 ) Pub Date : 2021-08-14 , DOI: 10.1016/j.tsf.2021.138888
Stephen J. Turrell 1, 2 , Stefanie Zekoll 1, 2 , Junliang Liu 1 , Chris R.M. Grovenor 1, 2 , Susannah C. Speller 1
Affiliation  

A radio frequency (RF) magnetron sputter deposition process designed for low-cost, high-rate fabrication of LiCoO2 (LCO) thin films was developed and used to fabricate approximately phase pure cathodes with the R3¯m crystal structure, strong (104) preferred orientation and high discharge capacities. Starting from a typical set of processing conditions for LCO films, the values of key deposition and post-deposition parameters were systematically changed to increase the deposition rate, simplify the sputter deposition process and minimize process gas use without compromising the structural properties and electrochemical performance. Cathodes were deposited onto Waspaloy (58Ni-19Cr-14Co-Mo-Ti-Al-Fe [wt%]) foil current collectors to provide enhanced thermal stability during post-deposition annealing. The best properties were attained using a process pressure of 0.5 Pa, an RF power density of 5.5 W cm−2 and a post-deposition anneal in air at 600 °C for 2 h. A sintered sputter target, oxygen gas flow and substrate heating were not required. This set of conditions resulted in a high deposition rate of ∼700–790 nm h−1, allowing the formation of a relatively thick (∼2.8–3.2 µm) film in 4 h. Furthermore, high maximum specific and areal discharge capacities of 132 mAh g−1 / 62 µAh cm−2µm−1 and 172 μAh cm−2 were attained during galvanostatic cycling at a rate of 0.1 C with an organic liquid electrolyte, which are among the highest values reported. Cycling rate tests showed that the thin-film LCO cathodes could deliver capacity up to a cycling rate of at least 2 C without causing any significant cell damage.



中文翻译:

薄膜 LiCoO2 阴极的潜在制造工艺优化

开发了一种专为低成本、高速率制造 LiCoO 2 (LCO) 薄膜而设计的射频 (RF) 磁控溅射沉积工艺,并用于制造具有电阻3¯晶体结构、强(104)择优取向和高放电容量。从一组典型的 LCO 薄膜加工条件开始,系统地改变了关键沉积和沉积后参数的值,以提高沉积速率、简化溅射沉积过程并在不影响结构特性和电化学性能的情况下最大限度地减少工艺气体的使用。阴极沉积在 Waspaloy (58Ni-19Cr-14Co-Mo-Ti-Al-Fe [wt%]) 箔集流体上,以在沉积后退火期间提供增强的热稳定性。使用 0.5 Pa 的工艺压力、5.5 W cm -2的射频功率密度获得最佳性能和在空气中在 600°C 下进行 2 小时的沉积后退火。不需要烧结溅射靶、氧气流和基板加热。这组条件导致~700-790 nm h -1的高沉积速率,允许在4 小时内形成相对较厚(~2.8-3.2 µm)的薄膜。此外,在使用有机液体电解质以 0.1 C 的速率进行恒电流循环期间获得了 132 mAh g -1 / 62 µAh cm -2 µm -1和 172 µAh cm -2 的高最大比放电容量和面积放电容量,其中包括报告的最高值。循环速率测试表明,薄膜 LCO 阴极可以提供高达至少 2 C 的循环速率的容量,而不会造成任何显着的电池损坏。

更新日期:2021-08-19
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