We have measured the absolute intensities of the spectral lines of Kr, Ar, and O ions (CO₂ gas), which are of interest for reflectometry, microscopy, and lithography in the wavelength range of 10 – 18 nm. We have used pulsed excitation by an Nd : YAG laser with an output wavelength λ = 1064 nm, a pulse energy of 0.8 J, a pulse duration of 5.2 ns and a pulse repetition rate of 10 Hz. The targets are formed during gas outflow through a pulsed supersonic conical nozzle for an inlet gas pressure of 3.5 bar. A spectrometer based on X-ray multilayer mirrors and its calibration procedure are described in detail. The absolute intensities of the spectral lines of Kr IX (λ = 11.5 nm; number of photons: N = 9.3 10¹² photons pulse⁻¹), Ar VIII (λ = 13.84 nm, N = 3 10¹² photons pulse⁻¹), and O VI (λ = 12.98 nm, N = 5.17 10¹² photons pulse⁻¹). The results are compared with the data obtained for Xe ions under the same experimental conditions at the same wavelengths.

我们已经测量了 Kr、Ar 和 O 离子（CO ₂气体）的谱线的绝对强度，这些谱线在 10 – 18 nm 的波长范围内对反射计、显微术和光刻很感兴趣。我们使用了 Nd: YAG 激光器的脉冲激发，输出波长λ = 1064 nm，脉冲能量为 0.8 J，脉冲持续时间为 5.2 ns，脉冲重复率为 10 Hz。目标是在气体通过脉冲超音速锥形喷嘴流出期间形成的，入口气体压力为 3.5 巴。详细描述了基于 X 射线多层反射镜的光谱仪及其校准程序。Kr IX 谱线的绝对强度（λ = 11.5 nm；光子数：N = 9.3 10 ¹²光子脉冲^-1 )、Ar VIII ( λ = 13.84 nm, N = 3 10 ¹²光子脉冲^-1 ) 和 O VI ( λ = 12.98 nm, N = 5.17 10 ¹²光子脉冲^-1 )。将结果与在相同实验条件下相同波长下获得的 Xe 离子数据进行比较。