We investigate the drying process of monodisperse colloidal film over a wide range of Péclet numbers (Pe) by using the Brownian dynamics simulation. We analyze the detailed process in three aspects; accumulation front, normal stress, and microstructure. The evolution of particle distribution is quantified by tracking the accumulation front. The accumulated particles contribute to the continuous increase of the normal stress at the interface. At the substrate, the normal stress first stays constant and then increases as the accumulation front touches the substrate. We quantitatively analyze the stress development by a scaled normal stress difference between the two boundaries. At all tested Pe, the stress difference increases to the maximum, followed by a decrease during drying. Interestingly, a mismatch is observed between the stress difference maximum and the initial stress increase at the substrate. The microstructural analysis reveals that this mismatch is related to the microstructural development at the substrate.

中文翻译：

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单分散胶体薄膜的干燥机理：法向应力的演变及其与微观结构的相关性

我们通过使用布朗动力学模拟研究了单分散胶体膜在很宽的佩克莱数 ( Pe )范围内的干燥过程。我们从三个方面分析了详细的过程；堆积前沿、正应力和微观结构。粒子分布的演变通过跟踪累积前沿来量化。累积的颗粒有助于界面处法向应力的不断增加。在基板上，法向应力首先保持不变，然后随着堆积前沿接触基板而增加。我们通过两个边界之间按比例缩放的正应力差异来定量分析应力发展。在所有测试Pe, 应力差增大到最大值，然后在干燥过程中减小。有趣的是，在应力差最大值和基底处的初始应力增加之间观察到不匹配。微观结构分析表明，这种不匹配与基材的微观结构发展有关。