From Lab to Fab: Enabling Enhanced Control of Block Polymer Thin-Film Nanostructures,ACS Applied Polymer Materials

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From Lab to Fab: Enabling Enhanced Control of Block Polymer Thin-Film Nanostructures
ACS Applied Polymer Materials ( IF 4.4 ) Pub Date : 2021-08-12 , DOI: 10.1021/acsapm.1c00680
Eric R. Gottlieb ₁ , Aynur Guliyeva ₁ , Thomas H. Epps _{1,

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Affiliation

Block polymer (BP) self-assembly is an ideal approach to generate periodic nanostructures for thin-film applications such as nanolithography, ultrahigh-density memory storage, sensors, and membrane filtration. However, numerous commercial uses require well-ordered nanopatterns and/or precisely controlled domain orientations that can be produced quickly and reliably. In this Spotlight on Applications, advances in BP thin-film fabrication are highlighted including fundamental studies of BP microphase separation, methods to anneal with improved ordering kinetics, and techniques for shear-based directed self-assembly (DSA); the studies discussed represent important steps toward effective large-area manufacturing of nanoscale features. First, combinatorial/gradient and in situ investigations of interfacial energetics, solvent interactions, and DSA are presented because of the unique insights they provide with respect to morphology control. Next, methods to manipulate BP thin-film morphologies by annealing or shear-based DSA are discussed, highlighting key aspects for these approaches: speed, adaptability roll-to-roll compatibility, and BP system versatility. Finally, an overview of some of the challenges that limit the wider adoption of BP thin-film technologies, and several opportunities to overcome these hurdles are considered, such as latent alignment and multistep processing.

中文翻译：

从实验室到晶圆厂：增强对嵌段聚合物薄膜纳米结构的控制

嵌段聚合物 (BP) 自组装是为薄膜应用（如纳米光刻、超高密度存储、传感器和膜过滤）生成周期性纳米结构的理想方法。然而，许多商业用途需要可以快速可靠地生产的有序纳米图案和/或精确控制的域方向。在此应用聚焦中，重点介绍了 BP 薄膜制造的进展，包括 BP 微相分离的基础研究、改进排序动力学的退火方法以及基于剪切的定向自组装 (DSA) 技术；所讨论的研究代表了有效大面积制造纳米级特征的重要步骤。一、组合/梯度和原位介绍了界面能量学、溶剂相互作用和 DSA 的研究，因为它们在形态控制方面提供了独特的见解。接下来，讨论了通过退火或基于剪切的 DSA 来操纵 BP 薄膜形态的方法，重点介绍了这些方法的关键方面：速度、适应性、卷对卷兼容性和 BP 系统的多功能性。最后，概述了限制 BP 薄膜技术更广泛采用的一些挑战，并考虑了克服这些障碍的几个机会，例如潜在对准和多步处理。

更新日期：2021-09-10

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