This paper presents a W-band dual-band waveguide filter using SU-8 photoresist UV lithography technology. The filter has a parallel structure with both the bands of fourth-order quasi-elliptic responses by adopting easily manufactured coupling structures, enabling improved stopband rejection. The filter was designed to have two passbands centered at 80 GHz and 100 GHz and each band can be optimized independently without impact on the other. The fabricated prototype has small dimension errors and low surface roughness. Measured results show a good agreement with the simulated ones, with insertion losses for two passbands of 0.79 dB and 0.54 dB, return losses better than 10 dB, and fractional bandwidths of 7.2 % and 5.4 %. The experimental results are discussed and compared with the ones of similar structures using other machining techniques, confirming the feasibility of the design and fabrication methods of the filter.

本文介绍了一种使用 SU-8 光刻胶紫外光刻技术的 W 波段双波段波导滤波器。该滤波器采用易于制造的耦合结构，具有四阶准椭圆响应频带的并行结构，可提高阻带抑制。该滤波器设计为具有两个以 80 GHz 和 100 GHz 为中心的通带，每个频带都可以独立优化，而不会相互影响。制造的原型具有较小的尺寸误差和较低的表面粗糙度。测量结果与模拟结果非常吻合，两个通带的插入损耗分别为 0.79 dB 和 0.54 dB，回波损耗优于 10 dB，分数带宽分别为 7.2% 和 5.4%。讨论了实验结果，并与使用其他加工技术的类似结构的结果进行了比较，