A near-surface redeposition layer is formed in the chemical mechanical polishing process of silicate glasses. In this work, secondary ion mass spectroscopy analyzer and transmission electron microscope are used to investigate the effect of bulk and pad materials on the microstructure and contaminations of the redeposition layer. The results suggest that the polishing materials with higher chemical reactivity will generate a deeper redeposition layer with higher concentration of contaminant elements, which will improve the surface quality by mitigating the mechanical abrasion effect. Then, a more detailed chemical mechanism of the redeposition layer formation has been concluded according to the chemical reaction and arrhenius equation, which can explain the effect of bulk materials and polishing pad on the redeposition layer well. These findings are helpful to understand the chemical process of polishing and improve the lifetime and quality of optical components especially in UV or high-power laser systems.

近表面再沉积层是在硅酸盐玻璃的化学机械抛光过程中形成的。在这项工作中，二次离子质谱分析仪和透射电子显微镜被用来研究块状和垫材料对再沉积层的微观结构和污染的影响。结果表明，具有较高化学反应性的抛光材料会产生较深的再沉积层，污染物元素浓度较高，这将通过减轻机械磨损效应来提高表面质量。然后，根据化学反应和阿累尼乌斯方程得出了再沉积层形成的更详细的化学机理，可以很好地解释块状材料和抛光垫对再沉积层的影响。