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Growth and characterization of uranium oxide thin films deposited by polymer assisted deposition
Thin Solid Films ( IF 2.0 ) Pub Date : 2021-08-11 , DOI: 10.1016/j.tsf.2021.138874
Izabela Kruk 1 , Brian L. Scott 1 , Erik B. Watkins 1 , Laura E. Wolfsberg 2
Affiliation  

A thin film of uranium oxide was deposited by polymer assisted deposition on a single crystal lanthanum aluminate - strontium aluminum tantalate substrate. The deposition resulted in formation of epitaxial thin film of uranium oxide, which could be attributed to α-U3O8 or α-UO3. X-ray diffraction revealed preferential orientation along (100) in case of α-U3O8 or (001) for α-UO3 for the thin film. A combination of x-ray and neutron reflectometry proved the sample to be α-U3O8. The film was of 17 nm thickness covered by a capping layer. The less dense capping layer could be a manifestation of surface water adsorbed on the sample.



中文翻译:

聚合物辅助沉积法沉积的氧化铀薄膜的生长和表征

通过聚合物辅助沉积在单晶铝酸镧-钽酸锶铝衬底上沉积氧化铀薄膜。沉积导致氧化铀外延薄膜的形成,这可能归因于α-U 3 O 8或α-UO 3。X 射线衍射揭示了在α-U 3 O 8 的情况下沿(100)或对于薄膜的α-UO 3 的(001)优先取向。X 射线和中子反射法的组合证明样品是 α-U 3 O 8。该膜厚度为 17 nm,被覆盖层覆盖。较低密度的覆盖层可能是表面水吸附在样品上的表现。

更新日期:2021-08-20
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