Abstract

The effect of introducing nitrogen into the reaction mixture during magnetron sputtering on the corrosion-electrochemical behavior of Ti–O–N films is studied using electrochemical and gravimetric methods. Polarization studies of electrochemical dissolution of films in an aqueous solution of 3% NaCl in a potentiostatic mode are presented. It is found that, upon dissolution of films, areas of passivation, activation, and trans-passivation of the coating surface associated with the formation of oxide films and titanium chlorides on the sample surface are observed. It is proved that thin films obtained with a high nitrogen content exhibit higher corrosion resistance. The main values of corrosion, namely, mass, depth, and current indicators, are calculated.

中文翻译：

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氮对反应磁控溅射沉积 Ti-O-N 薄膜耐腐蚀性的影响

摘要

使用电化学和重量分析方法研究了在磁控溅射过程中将氮气引入反应混合物中对 Ti-O-N 薄膜腐蚀电化学行为的影响。介绍了以恒电位模式在 3% NaCl 水溶液中电化学溶解薄膜的极化研究。发现，在膜溶解时，观察到与在样品表面上形成氧化膜和氯化钛相关的涂层表面的钝化、活化和反式钝化区域。事实证明，以高氮含量获得的薄膜表现出更高的耐腐蚀性。计算腐蚀的主要值，即质量、深度和电流指标。