Since its beginning in 1992 in Japan, International Symposium on Semiconductor Manufacturing (ISSM) has provided unique opportunities to share the best practices of semiconductor manufacturing technologies for professionals. At the symposiums, semiconductor manufacturing professionals discussed the technologies developed to meet the worldwide requirements for advanced manufacturing. It is becoming crucial to re-examine semiconductor manufacturing in terms of fundamental principles to improve the performance of semiconductor devices. Moreover, utilizing artificial intelligence and machine learning technologies to improve semiconductor manufacturing have become a new challenge. These manufacturing technology challenges are showing the need for drastic revolutionary concept and stronger collaborative efforts to find solutions to the precompetitive challenges.

中文翻译：

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2020年国际半导体制造研讨会客座编辑专题


自 1992 年在日本举办以来，国际半导体制造研讨会 (ISSM) 为专业人士提供了分享半导体制造技术最佳实践的独特机会。在研讨会上，半导体制造专业人士讨论了为满足全球先进制造要求而开发的技术。从基本原理角度重新审视半导体制造以提高半导体器件的性能变得至关重要。此外，利用人工智能和机器学习技术来改进半导体制造已成为新的挑战。这些制造技术挑战表明需要彻底的革命性概念和更强有力的协作努力来寻找应对竞争前挑战的解决方案。