This paper describes a chamber and recipe-independent fault detection and classification (FDC) indicator using the example of aluminum sputtering tools. We developed this indicator to detect abnormal discharge in an aluminum sputtering chamber when using a legacy FDC system. Abnormal discharge has several modes in the sputtering chamber, with abnormal discharge to a wafer commonly causing pattern defects. The indicator has been improved to detect only this problem, and to minimize the impact of false alarms that cause a loss of equipment productivity. The indicator can be readily extended to new chambers and the control limits are easily set for all recipes. This is because the equation for the indicator is very simple, and both the equation and the control limits are common to all sputtering chambers and recipes. It can therefore significantly reduce the setup work required of engineers, which is one of the biggest challenges in high-mix semiconductor manufacturing. The indicator is easily applied to newly installed tools at start of production and restrains the number of scrap wafers at minimum level. We also describe the mechanism of trace data changes in abnormal discharge modes using equivalent electrical circuits.

中文翻译：

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高混合半导体制造中与腔室和配方无关的 FDC 指示器


本文以铝溅射工具为例，介绍了一种与室和配方无关的故障检测和分类 (FDC) 指示器。我们开发此指示器是为了在使用传统 FDC 系统时检测铝溅射室中的异常放电。溅射室中的异常放电有多种模式，对晶圆的异常放电通常会导致图案缺陷。该指示器经过改进，可以仅检测此问题，并最大限度地减少导致设备生产力损失的误报的影响。该指示器可以轻松扩展到新的室，并且可以轻松地为所有配方设置控制限值。这是因为指示剂的方程非常简单，并且方程和控制限值对于所有溅射室和配方都是通用的。因此，它可以显着减少工程师所需的设置工作，这是高混合半导体制造中最大的挑战之一。该指标很容易应用于生产开始时新安装的工具，并将废弃晶圆的数量限制在最低水平。我们还使用等效电路描述了异常放电模式下跟踪数据变化的机制。