X-Ray White Beam Interferences on Thin Crystals,Crystal Research and Technology

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X-Ray White Beam Interferences on Thin Crystals
Crystal Research and Technology ( IF 1.5 ) Pub Date : 2021-08-06 , DOI: 10.1002/crat.202100085
Mirko Heckert ₁ , Stefan Enghardt ₁ , Jürgen Bauch ₁

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Results of white beam X-ray interference measurements on almost perfect semiconductor wafers are presented. A specific measurement geometry allows for the investigation of diffraction effects on thin wafers down to at least 375 µm with a simple experimental setup (standard lab CT with microfocus X-ray tube). Furthermore, the dynamic diffraction effect of double refraction has been studied in detail for thicker samples. This might lead to a new wafer testing method as the observed dynamic effects are very sensible on crystal quality.

中文翻译：

薄晶体上的 X 射线白光束干涉

介绍了对几乎完美的半导体晶片的白束 X 射线干涉测量结果。特定的测量几何结构允许通过简单的实验设置（带有微焦点 X 射线管的标准实验室 CT）研究小至至少 375 µm 的薄晶片上的衍射效应。此外，还详细研究了较厚样品的双折射动态衍射效应。这可能会导致一种新的晶圆测试方法，因为观察到的动态效应对晶体质量非常敏感。

更新日期：2021-10-09

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