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Optimization of ITO thin film properties as a function of deposition time using the swanepoel method
Optical Materials ( IF 3.8 ) Pub Date : 2021-08-04 , DOI: 10.1016/j.optmat.2021.111411
Abdelbaki Hacini 1 , Ahmad Hadi Ali 1 , Nurul Nadia Adnan 1
Affiliation  

This work reports the effect of deposition time on the properties of indium tin oxide ITO thin film deposited by RF magnetron sputtering on glass and Si substrates. The structural investigation shows that the as-deposited ITO thin films on a glass substrate have a polycrystalline structure, where the crystalline size increase with the deposition time. Moreover, the XRD results reveal that the ITO films have a cubic structure preferentially oriented along (222) and (622) planes. AFM results show an increase of the surface roughness from 1.2 nm to 2.2 nm. The optical transmittance spectra show high transmittance of more than 80 % for all samples at the visible and near-infrared ranges. The optical band gap varied between 3.52 eV and 3.59 eV with the increasing deposition time. In addition, the optical analysis gives a normal dispersion for the refractive index that has values varied between 1.5 and 1.65. The Swanepoel method was deployed for calculating thicknesses of ITO thin film. The method demonstrated the thicknesses increase from 141.3 nm to 816.0 nm for 60 min. Further, the calculated thickness agrees with the FESEM cross-section results. The EDX results of the ITO thin film show the concentration of the element increased with the increase of the film thickness. The properties of ITO thin films can be controlled by the amount of deposition time. This is an important parameter in the applications of solar cell work as a transparent conducting layer.



中文翻译:

使用 swanepoel 方法优化 ITO 薄膜特性作为沉积时间的函数

这项工作报告了沉积时间对通过射频磁控溅射在玻璃和硅衬底上沉积的氧化铟锡 ITO 薄膜性能的影响。结构研究表明,玻璃基板上沉积的 ITO 薄膜具有多晶结构,其中晶体尺寸随着沉积时间的增加而增加。此外,XRD 结果表明 ITO 薄膜具有立方结构,优先沿(222)和(622)面取向。AFM 结果显示表面粗糙度从 1.2 nm 增加到 2.2 nm。光学透射光谱显示所有样品在可见光和近红外范围内的高透射率超过 80%。随着沉积时间的增加,光学带隙在 3.52 eV 和 3.59 eV 之间变化。此外,光学分析给出了折射率的正常色散,其值在 1.5 和 1.65 之间变化。Swanepoel 方法用于计算 ITO 薄膜的厚度。该方法证明厚度从 141.3 nm 增加到 816.0 nm 持续 60 分钟。此外,计算出的厚度与 FESEM 横截面结果一致。ITO薄膜的EDX结果表明元素浓度随着薄膜厚度的增加而增加。ITO薄膜的特性可以通过沉积时间的量来控制。这是太阳能电池作为透明导电层的应用中的一个重要参数。该方法证明厚度从 141.3 nm 增加到 816.0 nm 持续 60 分钟。此外,计算出的厚度与 FESEM 横截面结果一致。ITO薄膜的EDX结果表明元素浓度随着薄膜厚度的增加而增加。ITO薄膜的特性可以通过沉积时间的量来控制。这是太阳能电池作为透明导电层的应用中的一个重要参数。该方法证明厚度从 141.3 nm 增加到 816.0 nm 持续 60 分钟。此外,计算出的厚度与 FESEM 横截面结果一致。ITO薄膜的EDX结果表明元素浓度随着薄膜厚度的增加而增加。ITO薄膜的特性可以通过沉积时间的量来控制。这是太阳能电池作为透明导电层的应用中的一个重要参数。

更新日期:2021-08-04
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