Colloidal quantum dot (QD) emitters show great promise in the development of next-generation displays. Although various solution-processed techniques have been developed for nanomaterials, high-resolution and uniform patterning technology amicable to manufacturing is still missing. Here, we present large-area, high-resolution, full-color QD patterning utilizing a selective electrophoretic deposition (SEPD) technique. This technique utilizes photolithography combined with SEPD to achieve uniform and fast fabrication, low-cost QD patterning in large-area beyond 1,000 pixels-per-inch. The QD patterns only deposited on selective electrodes with precisely controlled thickness in a large range, which could cater for various optoelectronic devices. The adjustable surface morphology, packing density and refractive index of QD films enable higher efficiency compared to conventional solution-processed methods. We further demonstrate the versatility of our approach to integrate various QDs into large-area arrays of full-color emitting pixels and QLEDs with good performance. The results suggest a manufacture-viable technology for commercialization of QD-based displays.

胶体量子点 (QD) 发射器在下一代显示器的开发中显示出巨大的前景。尽管已经为纳米材料开发了各种溶液处理技术，但仍然缺乏适合制造的高分辨率和均匀图案化技术。在这里，我们展示了利用选择性电泳沉积 (SEPD) 技术的大面积、高分辨率、全色 QD 图案化。该技术利用光刻与 SEPD 相结合，在超过每英寸 1,000 像素的大面积中实现均匀、快速的制造、低成本的 QD 图案化。量子点图案仅沉积在大范围内精确控制厚度的选择性电极上，可满足各种光电器件的需求。可调节的表面形态，与传统的溶液处理方法相比，QD 薄膜的堆积密度和折射率可实现更高的效率。我们进一步证明了我们的方法的多功能性，将各种 QD 集成到具有良好性能的全色发光像素和 QLED 的大面积阵列中。结果表明了一种用于基于 QD 的显示器商业化的制造可行技术。