Adsorption of a metalloid, boron (B) on W(100) was investigated using low energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS) and scanning tunneling microscopy (STM) in ultra-high vacuum (UHV) condition. W(100)-c(2 × 2)-B superstructure was formed by annealing at high temperature (1200 K). The best fit structure obtained from LEED analysis and STM observation manifested that B atom positioned at four-fold hollow site with the coverage of 0.5 ML, forming low B concentrated tungsten boride compound, W₂B, on W(100) surface. The W atoms beneath B atoms moved downward to form B-W bonds for stabilizing the surface atoms. XPS confirmed B 1s peak shifting towards lower binding energy compared to pure B 1s, which indicated the charge transfer from W to B. No ordered structures other than c(2 × 2) have been observed with the increase of B, which indicates that B atoms diffuse into bulk, not forming ordered B sheets, due to the low diffusion barrier into bulk by annealing.

使用低能电子衍射 (LEED)、X 射线光电子能谱 (XPS) 和扫描隧道显微镜 (STM) 在超高真空 (UHV) 条件下研究了类金属硼 (B) 在 W(100) 上的吸附。W(100)-c(2 × 2)-B 超结构是通过高温 (1200 K) 退火形成的。LEED 分析和 STM 观察得到的最佳拟合结构表明，B 原子位于四重空心位置，覆盖范围为 0.5 ML，形成低 B 浓度的硼化钨化合物 W ₂B，在 W(100) 表面上。B 原子下方的 W 原子向下移动以形成 BW 键以稳定表面原子。XPS 证实与纯 B 1s 相比，B 1s 峰向较低结合能移动，这表明电荷从 W 转移到 B。随着 B 的增加，除了 c(2 × 2) 之外没有观察到有序结构，这表明 B由于通过退火进入体的低扩散势垒，原子扩散到体中，而不形成有序的 B 片。