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Multi-layer thin-film deposition for high-performance X-ray field-emission characteristics
International Journal of Modern Physics B ( IF 2.6 ) Pub Date : 2021-07-22 , DOI: 10.1142/s0217979221400439
Tae Hwan Jang 1 , Tae Gyu Kim 1 , Mun Ki Bae 2 , Kyuseok Kim 3 , Jaegu Choi 3
Affiliation  

In this study, we developed a nanoscale emitter having a multi-layer thin-film nanostructure in an effort to maximize the field-emission effect with a low voltage difference. The emitter was a sapphire board on which tungsten–DLC multi-player thin film was deposited using PVD and CVD processes. This multi-layer thin-film emitter was examined in a high-vacuum X-ray tube system. Its field-emission efficiency according to the applied voltage was then analyzed.

中文翻译:

用于高性能 X 射线场发射特性的多层薄膜沉积

在这项研究中,我们开发了一种具有多层薄膜纳米结构的纳米级发射器,以努力在低电压差的情况下最大化场发射效应。发射器是一块蓝宝石板,上面使用 PVD ​​和 CVD 工艺沉积了钨-DLC 多层薄膜。这种多层薄膜发射器在高真空 X 射线管系统中进行了检查。然后分析其根据施加电压的场发射效率。
更新日期:2021-07-22
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