Optical emission spectroscopy (OES) has been used as an in-situ method to monitor the film deposition carried out using a combination of two plasma-assisted techniques; pulsed laser deposition (PLD) and magnetron sputtering (MS). In this work, the plasmas produced during the PLD ablation of a gold target in an argon atmosphere and its simultaneous use with MS of ZnO were characterized by OES. Neutral atoms of Au, Ar, and Zn and ions of Au were identified, and the temporal and spatial evolution of their emission lines was studied along the axis of the PLD plasma expansion. During the PLD of Au an increment in the emission intensity of neutral Au near the substrates, as a function of the laser pulse fluence, demonstrated resputtering of the Au deposit by the high energy species produced by PLD. When the combination of PLD of Au and MS of ZnO was performed, a similar increment was observed in the emission intensity, but in this case of neutral Zn that was caused by the preferential resputtering of Zn from the ZnO-Au deposit. The MS plasma neither significantly affect the PLD plasma expansion nor did it affect the resputtering of the films.

中文翻译：

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等离子发射光谱法研究脉冲激光沉积 Au 并结合磁控管溅射 ZnO 产生的再溅射


光学发射光谱（OES）已被用作一种原位方法来监测结合两种等离子体辅助技术进行的薄膜沉积；脉冲激光沉积（PLD）和磁控溅射（MS）。在这项工作中，通过 OES 表征了在氩气气氛中 PLD 烧蚀金靶材期间产生的等离子体，以及同时使用 ZnO 的 MS 的情况。鉴定了 Au、Ar 和 Zn 的中性原子以及 Au 离子，并研究了它们的发射线沿 PLD 等离子体膨胀轴的时间和空间演化。在 Au 的 PLD 过程中，基底附近中性 Au 的发射强度随激光脉冲注量的变化而增加，这表明 PLD 产生的高能物质对 Au 沉积物进行了再溅射。当结合使用 Au 的 PLD 和 ZnO 的 MS 时，在发射强度中观察到类似的增量，但在中性 Zn 的情况下，这是由 ZnO-Au 沉积物中 Zn 的优先再溅射引起的。 MS等离子体既不显着影响PLD等离子体膨胀，也不影响薄膜的再溅射。