A silica-based thin film was synthesized on polycarbonate substrates topped with acrylic primer. The synthesis was performed by chemical vapor deposition under a remote-type atmospheric pressure plasma. The source gas used was TrMS/O₂, and the carrier gas used was either He or Ar. The abrasion resistance and adhesion strength were improved by changing the carrier gas from He to Ar. After a standard Taber abrasion test, the minimum change in haze value was approximately 1.3% for a sample synthesized under Ar (below the 2.0% requirement for vehicle window glass). The adhesion strength between the thin film and the substrate probably improved because of the etching effect of the primer by the Ar plasma during the deposition. The results confirmed that atmospheric remote technology can synthesize silica-based films and demonstrated that the technology is applicable to manufacturing vehicle window glass replacements.

中文翻译：

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用于汽车应用的聚碳酸酯基材上二氧化硅基 CVD 薄膜的耐磨性提高

在涂有丙烯酸底漆的聚碳酸酯基材上合成二氧化硅基薄膜。该合成是在远程型大气压等离子体下通过化学气相沉积进行的。所用的源气体为 TrMS/O ₂，所用的载气是 He 或 Ar。通过将载气从 He 改为 Ar，提高了耐磨性和粘附强度。在标准泰伯磨损试验后，对于在氩气下合成的样品，雾度值的最小变化约为 1.3%（低于车窗玻璃的 2.0% 要求）。由于沉积过程中Ar等离子体对底漆的蚀刻作用，薄膜和基板之间的粘合强度可能提高。结果证实，大气遥感技术可以合成二氧化硅基薄膜，并证明该技术适用于制造车窗玻璃替代品。