Fabrication of Differently Shaped Polymeric Nanoneedle Arrays via Multistep Plasma Etching Using Silica Microparticles as Masks,Bulletin of the Korean Chemical Society

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Fabrication of Differently Shaped Polymeric Nanoneedle Arrays via Multistep Plasma Etching Using Silica Microparticles as Masks
Bulletin of the Korean Chemical Society ( IF 2.3 ) Pub Date : 2021-07-22 , DOI: 10.1002/bkcs.12343
Dong‐Hyun Lee ₁ , Hyung Joon Park ₁ , Yong Gi Cha Park ₁ , Kyu Back Lee _{1,

2,

3}

Affiliation

We established a method to produce differently shaped polymeric nanoneedle arrays using silica microparticles by using multistep plasma etch processes. The etching conditions of each step were determined by exploring etching parameters such as power, bias power, gas composition and amount, pressure and time. The silica microparticles became unstable and irregular nanoneedle arrays were formed due to difference of etching rates between silica and polymer when silica microparticles were etched continuously in one step. Through the introduction of stabilization step in which selective etching is done on silica microparticle to reduce the diameter of silica microparticles and hence to move the center of mass of the silica microparticle inward, the instability of silica mask was removed and irregularity of nanostructures was minimized. As a result, multistep etching process to fabricate polymeric nanoneedle arrays was established. Depending on the conditions of each step, polymeric nanostructure arrays with various morphology were fabricated.

中文翻译：

使用二氧化硅微粒作为掩膜，通过多步等离子体蚀刻制造不同形状的聚合物纳米针阵列

我们建立了一种方法，通过使用多步等离子体蚀刻工艺，使用二氧化硅微粒生产不同形状的聚合物纳米针阵列。每个步骤的蚀刻条件是通过探索蚀刻参数如功率、偏置功率、气体成分和数量、压力和时间来确定的。在一步连续蚀刻二氧化硅微粒时，由于二氧化硅和聚合物之间的蚀刻速率不同，二氧化硅微粒变得不稳定并且形成不规则的纳米针阵列。通过引入对二氧化硅微粒进行选择性蚀刻以减小二氧化硅微粒的直径从而使二氧化硅微粒的质心向内移动的稳定化步骤，消除了二氧化硅掩模的不稳定性并最小化了纳米结构的不规则性。其结果，建立了制造聚合物纳米针阵列的多步蚀刻工艺。根据每个步骤的条件，制造了具有各种形态的聚合物纳米结构阵列。

更新日期：2021-09-23

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