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High-resolution X-ray flash radiography of Ti characteristic lines with multilayer Kirkpatrick–Baez microscope at the Shenguang-II Update laser facility
High Power Laser Science and Engineering ( IF 5.2 ) Pub Date : 2021-05-26 , DOI: 10.1017/hpl.2021.30
Shengzhen Yi , Feng Zhang , Qiushi Huang , Lai Wei , Yuqiu Gu , Zhanshan Wang

High-resolution X-ray flash radiography of Ti characteristic lines with a multilayer Kirkpatrick–Baez microscope was developed on the Shenguang-II (SG-II) Update laser facility. The microscope uses an optimized multilayer design of Co/C and W/C stacks to obtain a high reflection efficiency of the Ti characteristic lines while meeting the precise alignment requirement at the Cu Kα line. The alignment method based on dual simulated balls was proposed herein, which simultaneously realizes an accurate indication of the center field of view and the backlighter position. The optical design, multilayer coatings, and alignment method of the microscope and the experimental result of Ti flash radiography of the Au-coned CH shell target on the SG-II Update are described.

中文翻译:

在神光-II 更新激光设施中使用多层 Kirkpatrick-Baez 显微镜对 Ti 特征线进行高分辨率 X 射线闪光射线照相

使用多层 Kirkpatrick-Baez 显微镜对 Ti 特征线进行高分辨率 X 射线闪光射线照相是在神光-II (SG-II) 更新激光设备上开发的。该显微镜采用优化的 Co/C 和 W/C 叠层多层设计,以获得 Ti 特征线的高反射效率,同时满足 Cu Kα 线的精确对准要求。本文提出了基于双模拟球的对准方法,同时实现了中心视野和背光源位置的准确指示。描述了显微镜的光学设计、多层镀膜和对准方法,以及 SG-II Update 上金锥 CH 壳靶的 Ti 闪光射线照相实验结果。
更新日期:2021-05-26
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