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STRUCTURE, MORPHOLOGY AND MAGNETIC PROPERTIES OF ELECTRODEPOSITED NI FILMS
Surface Review and Letters ( IF 1.2 ) Pub Date : 2021-07-16 , DOI: 10.1142/s0218625x21500918 T. KACEL 1 , A. GUITTOUM 2 , M. HEMMOUS 3 , R. M. ÖKSÜZOGLU 2 , A. AZIZI 4
Surface Review and Letters ( IF 1.2 ) Pub Date : 2021-07-16 , DOI: 10.1142/s0218625x21500918 T. KACEL 1 , A. GUITTOUM 2 , M. HEMMOUS 3 , R. M. ÖKSÜZOGLU 2 , A. AZIZI 4
Affiliation
Ni thin films have been electrodeposited on n -Si (100) substrates for different deposition times at a fixed potential of 2 V. The as-elaborated films have been characterized by Rutherford backscattering spectroscopy (RBS), X-ray diffraction (XRD), atomic force microscopy (AFM) and vibrating sample magnetometry (VSM). From RBS spectra, we have extracted the Ni film thicknesses, t ( nm ) , which ranges from 105 nm to 710 nm. The analysis of XRD spectra shows the existence of a strong ⟨ 111⟩ texture for all film thicknesses. The strain values ε h k l are negative for all Ni films indicating that they are under compressive stresses. The grains size, 〈 D ( Å ) 〉 , increases to reach a maximum for t = 4 6 5 nm then decreases again with increasing t (nm). From AFM images, we have shown that the films become progressively smoother with increasing thickness. We have shown that the coercive field measured in parallel geometry, H C | | , increases with increasing thickness.
中文翻译:
电沉积镍薄膜的结构、形态和磁性
镍薄膜已电沉积在n -Si (100) 衬底,用于不同沉积时间,固定电位为 2 V. 所制备的薄膜已通过卢瑟福背散射光谱 (RBS)、X 射线衍射 (XRD)、原子力显微镜 (AFM) 和振动样品磁强计 (VSM) 进行了表征。从 RBS 光谱中,我们提取了 Ni 膜的厚度,吨 ( 纳米 ) ,范围从 105 nm 到 710 nm。XRD谱分析表明存在强⟨ 111⟩ 所有薄膜厚度的纹理。应变值ε H ķ l 所有 Ni 薄膜均为负值,表明它们处于压缩应力下。颗粒大小,〈 D ( 一种 ) 〉 , 增加到最大值吨 = 4 6 5 nm 然后随着增加再次减小吨 (纳米)。从 AFM 图像中我们可以看出,随着厚度的增加,薄膜会变得越来越光滑。我们已经证明,在平行几何中测量的矫顽场,H C | | , 随着厚度的增加而增加。
更新日期:2021-07-16
中文翻译:
电沉积镍薄膜的结构、形态和磁性
镍薄膜已电沉积在