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Dense VSiCN coatings deposited by filament-assisted reactive magnetron sputtering with varying amorphous phase precursor flow rates
Surface & Coatings Technology ( IF 5.3 ) Pub Date : 2021-07-14 , DOI: 10.1016/j.surfcoat.2021.127507
Forest C. Thompson 1 , Frank M. Kustas 2 , Kent E. Coulter 3 , Grant A. Crawford 1, 4
Affiliation  

Phase-modulated VSiCN coatings were deposited with hot filament assistance by magnetron sputtering of a vanadium target in a gas mixture of argon, nitrogen, and hexamethyldisilazane (HMDS). HMDS flow conditions and total working pressure were varied to influence coating amorphous phase content (0 at.% ≤ Si ≤ 9 at.%). Scanning electron microscopy revealed that deposition with HMDS vapor disrupted columnar growth and increased coating growth rate by as much as 27% relative to a VN0.8 reference. Coating surface morphologies were characterized by atomic force microscopy. A transition from a nodular appearance (Rq = 8.9 nm) for the VN0.8 coating to a pitted appearance (Rq = 2.7 nm) for the coating containing 9 at.% Si was observed. X-ray diffraction analysis and transmission electron microscopy indicated that the VSiCN coatings contained a nanocrystalline B1-VCxNy phase and an amorphous phase, whose phase fraction increased with HMDS flow. The crystallographic out-of-plane preferred orientation of the VN0.8 coating was (220) while all VSiCN coatings were (111) textured. Coating hardness and apparent elastic modulus were measured by nanoindentation. The VSiCN coating with 3 at.% Si exhibited the highest hardness of 31.4 GPa, which was 8.8 GPa greater than the VN0.8 coating. Coating apparent elastic modulus decreased with increasing HMDS flow from 288 GPa to 188 GPa. All coatings exhibited excellent adhesion to stainless steel substrates as evaluated by the Rockwell indentation test. The disruption of columnar growth and incorporation of Si in VSiCN coatings is a possible method of improving the high temperature wear resistance of VN-based coatings.



中文翻译:

通过灯丝辅助反应磁控溅射沉积的致密 VSiCN 涂层具有不同的非晶相前驱体流速

通过在氩气、氮气和六甲基二硅氮烷 (HMDS) 的气体混合物中磁控溅射钒靶,在热灯丝辅助下沉积相位调制 VSiCN 涂层。改变 HMDS 流动条件和总工作压力以影响涂层非晶相含量(0 at.% ≤ Si ≤ 9 at.%)。扫描电子显微镜显示,相对于 VN 0.8参考,使用 HMDS 蒸汽沉积破坏了柱状生长并使​​涂层生长速率增加了 27% 。通过原子力显微镜表征涂层表面形态。从 VN 0.8涂层的结节状外观 ( R q = 8.9 nm)到凹坑外观 ( R q = 2.7 nm) 观察到包含 9 at.% Si 的涂层。X 射线衍射分析和透射电子显微镜表明 VSiCN 涂层含有纳米晶 B1-VC x N y相和非晶相,其相分数随着 HMDS 流动而增加。VN 0.8涂层的晶面外优选取向为 (220),而所有 VSiCN 涂层均为 (111) 织构。通过纳米压痕测量涂层硬度和表观弹性模量。含 3 at.% Si 的 VSiCN 涂层表现出最高硬度 31.4 GPa,比 VN 0.8 高8.8 GPa涂层。随着 HMDS 流量从 288 GPa 增加到 188 GPa,涂层表观弹性模量降低。根据洛氏压痕测试的评估,所有涂层都表现出对不锈钢基材的优异附着力。在 VSiCN 涂层中破坏柱状生长和掺入 Si 是提高 VN 基涂层高温耐磨性的一种可能方法。

更新日期:2021-07-20
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