This paper reports on a novel HiPIMS-assisted CAE deposition process using a Ti target for the fabrication of TiN coatings on WC substrates. Our primary objective was to elucidate the influence of duty cycle on the microstructure and mechanical properties of the TiN coatings. Optical images revealed that decreasing the duty cycle led to a corresponding decrease in the number and size of surface macro-particles. A duty cycle of 3% was shown to maximize the flux of ion bombardment, which in turn maximized the number of nanocrystals, while minimizing the size of grains and columnar crystals. The resulting coating presented outstanding hardness (33.6 GPa), elastic modulus (507 GPa), and wear rate 3.32 (10⁻⁶ × mm³N⁻¹m⁻¹).

本文报道了一种新型 HiPIMS 辅助 CAE 沉积工艺，该工艺使用 Ti 靶材在 WC 基材上制造 TiN 涂层。我们的主要目标是阐明占空比对 TiN 涂层的微观结构和机械性能的影响。光学图像显示，降低占空比导致表面宏观粒子的数量和大小相应减少。显示 3% 的占空比可使离子轰击通量最大化，从而使纳米晶体的数量最大化，同时使晶粒和柱状晶体的尺寸最小化。所得涂层表现出优异的硬度（33.6 GPa）、弹性模量（507 GPa）和3.32（10 ^-6  × mm ³ N ^-1 m ^-1）的磨损率。