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FeMnSiCrNi Oxidation at 800 °C: Mechanism and Characterization of Improved Oxidation Resistance Generated by Vacuum Annealing Treatment
Oxidation of Metals ( IF 2.2 ) Pub Date : 2021-07-10 , DOI: 10.1007/s11085-021-10038-7
Artur Mariano de Sousa Malafaia 1 , Laurence Latu-Romain 2, 3 , Yves Wouters 2
Affiliation  

The oxidation resistance of an FeMnSiCrNi alloy was recently improved by vacuum heat treatment. However, a detailed characterization was still necessary to understand the effects of the treatment on the material structure and on the oxide evolution. This was the aim of the present study. Samples were vacuum annealed at 1100 °C for 10 h and the material volatilized was characterized by EDS/XRD; cross-sections were evaluated by SEM/EDS while surface analyses involved SEM/EDS, XPS and Raman. Oxidation exposures were performed after vacuum annealing for 1, 5, 10 and 24 h at 800 °C and the oxides were characterized by SEM/EDS, XRD, Raman; TEM-ASTAR and XPS were used after 1-h oxidation. The results demonstrated that vacuum annealing increases significantly the superficial roughness and that besides Cr2O3 formation, Mn incorporation in the oxide layer increased with the test duration, forming MnCr2O4 and then Mn2O3. Finally, silica was also observed at the metal/oxide interface.



中文翻译:

FeMnSiCrNi 在 800 °C 下氧化:真空退火处理提高抗氧化性的机理和表征

最近通过真空热处理提高了 FeMnSiCrNi 合金的抗氧化性。然而,为了了解处理对材料结构和氧化物演化的影响,仍然需要详细的表征。这是本研究的目的。样品在1100℃真空退火10h,挥发的材料用EDS/XRD表征;横截面由 SEM / EDS 评估,而表面分析涉及 SEM / EDS、XPS 和拉曼。在 800°C 真空退火 1、5、10 和 24 小时后进行氧化暴露,并通过 SEM/EDS、XRD、拉曼对氧化物进行表征;TEM-ASTAR 和 XPS 在氧化 1 小时后使用。结果表明,真空退火显着增加了表面粗糙度,除了 Cr 2 O3形成中,氧化层中的 Mn 结合随着测试时间的延长而增加,形成 MnCr 2 O 4,然后是 Mn 2 O 3。最后,还在金属/氧化物界面处观察到二氧化硅。

更新日期:2021-07-12
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