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Texture and grain boundary engineering in electrodeposited SnCu coatings and its effect on coating corrosion behaviour
Philosophical Magazine ( IF 1.5 ) Pub Date : 2021-07-11 , DOI: 10.1080/14786435.2021.1949067
Abhay Gupta 1 , Chandan Srivastava 1
Affiliation  

ABSTRACT

SnCu coatings (Cu between 0–33.0 at.%) were electrodeposited over mild steel. Corrosion analysis was performed over mirror polished SnCu coatings to remove surface morphology effect. Highest corrosion resistance was observed for the SnCu coating with ∼21.2 at.% Cu and lowest corrosion resistance was observed for the SnCu coating with ∼9.9 at.% Cu. Sn-rich phase and Cu6Sn5 intermetallic were present in all the coatings. For lower Cu content (∼6.0 at.% Cu), a significant fraction of Cu was found to be incorporated into the Sn rich solid solution phase, thus increasing strain within the grains. As the Cu content increased, the Cu6Sn5 phase formed predominantly at the Sn-rich phase grain boundaries. For the Sn rich phase, a preferred crystallographic orientation along the (001) was observed in SnCu coating with lower Cu content (Cu < 10 at.%). On the other hand, at high Cu content (Cu > 20 at.%), the low surface energy (100) texture was dominant. Addition of Cu decreased the Sn-rich phase grain size. The SnCu coating with ∼21.2 at.% Cu exhibited highest fraction of low angle grain boundaries (LAGBs) and low energy (031)[01¯3] twin boundaries. It was established that the presence of low surface free energy (100) atomic planes exposed to corrosive medium, a high fraction of LAGBs, and low energy (031)[01¯3] twin boundaries yields high corrosion resistance for SnCu coating with 21.2 at.% Cu, while a strong (001) texture and high strain within the grains, increased the corrosion susceptibility of the SnCu coating with ∼9.9 at.% Cu.



中文翻译:

电沉积 SnCu 涂层的织构和晶界工程及其对涂层腐蚀行为的影响

摘要

SnCu 涂层(Cu 在 0-33.0 at.% 之间)被电沉积在低碳钢上。在镜面抛光的 SnCu 涂层上进行腐蚀分析,以消除表面形态效应。观察到含有~21.2 at.% Cu 的 SnCu 涂层的耐腐蚀性最高,观察到含有~9.9 at.% Cu 的 SnCu 涂层的耐腐蚀性能最低。富锡相和Cu 6 Sn 5金属间化合物存在于所有涂层中。对于较低的 Cu 含量(~6.0 at.% Cu),发现很大一部分 Cu 被结合到富锡固溶体相中,从而增加了晶粒内的应变。随着 Cu 含量的增加,Cu 6 Sn 5相主要在富锡相晶界处形成。对于富锡相,在具有较低 Cu 含量(Cu < 10 at.%)的 SnCu 涂层中观察到沿 (001) 的优选晶体取向。另一方面,在高 Cu 含量(Cu > 20 at.%)下,低表面能 (100) 织构占主导地位。Cu的添加降低了富Sn相的晶粒尺寸。含~21.2 at.% Cu 的 SnCu 涂层表现出最高比例的低角度晶界 (LAGB) 和低能量(031)[01¯3]双边界。已确定存在暴露于腐蚀性介质的低表面自由能 (100) 原子平面、高比例的 LAGB 和低能量(031)[01¯3] 双晶界为含 21.2 at.% Cu 的 SnCu 涂层提供了高耐腐蚀性,而晶粒内的强(001)织构和高应变增加了含 9.9 at.% Cu 的 SnCu 涂层的腐蚀敏感性。

更新日期:2021-09-06
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