Amorphous vanadium pentoxide (major phase) thin films of various thicknesses were grown on the substrates that possessed low (aluminized quartz) and high (quartz) infrared (IR) emittance property utilizing radio frequency (RF) magnetron sputtering technique. Microstructural characterizations are carried out by several techniques such as noncontact optical profilometry, energy dispersive X-ray (EDX) spectroscopy, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and X-ray diffraction (XRD). The as-grown amorphous films show stoichiometric vanadium oxide, where vanadium is in V⁵⁺ as a major proportion compared with V⁴⁺ states. Thermo-optical properties, namely, solar transmittance (τ_s), reflectance (ρ_s), absorptance (α_s) and IR emittance (ε_ir) along with optical constant, for example, optical band gap, are evaluated. A modified Urbach equation was used to simulate the optical absorption data to understand the presence optical absorption below the band edge.

中文翻译：

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石英和镀铝石英上混合相射频磁控溅射氧化钒薄膜的光学、电子和微观结构特性

利用射频（RF）磁控溅射技术在具有低（镀铝石英）和高（石英）红外（IR）发射特性的基板上生长各种厚度的无定形五氧化二钒（主相）薄膜。微观结构表征通过多种技术进行，例如非接触式光学轮廓测定法、能量色散 X 射线 (EDX) 光谱、X 射线光电子能谱 (XPS)、原子力显微镜 (AFM) 和 X 射线衍射 (XRD)。生长的无定形薄膜显示出化学计量的氧化钒，其中与 V ⁴⁺状态相比，钒在 V ⁵⁺中占主要比例。热光学特性，即太阳光透射率 (τ _s )、反射率 (ρ _s)，评估吸收率 (α _s ) 和红外发射率 (ε _ir ) 以及光学常数，例如光学带隙。使用修改后的 Urbach 方程来模拟光吸收数据，以了解带边下方是否存在光吸收。