Two photochemical nano-polishing techniques for rough quartz surfaces are compared in terms of electrodynamics. The numerical modelling of the evanescent field configuration near the quartz surface is considered. The finite-element approach is used to solve the Helmholtz two-dimensional vector equation. The quartz surface coated with a liquid containing chlorine molecules is illuminated both from the quartz side and the liquid side. The efficiency is quantitatively estimated in both cases (an approximate nine-time difference in the irradiation source power is needed to obtain identical results). The results show that the features of the field formed by spatial spectrum components of the surface in both techniques are similar. But the interference between the incident wave and wave reflected from some interface spatial spectrum harmonics can affect the contrast of the evanescent field when the total internal reflection occurs. This should be taken into account when polishing a surface with a periodic profile.

在电动力学方面比较了两种用于粗糙石英表面的光化学纳米抛光技术。考虑了石英表面附近渐逝场配置的数值模拟。有限元方法用于求解亥姆霍兹二维向量方程。石英表面涂有含氯分子的液体，从石英侧和液体侧都受到照射。在两种情况下都对效率进行了定量估计（需要辐照源功率的大约九倍差才能获得相同的结果）。结果表明，两种技术中地表空间光谱分量形成的场的特征是相似的。但是当发生全内反射时，入射波和从某些界面空间光谱谐波反射的波之间的干扰会影响渐逝场的对比度。在抛光具有周期性轮廓的表面时应考虑到这一点。