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Low metal–insulator transition temperature of Ni-doped vanadium oxide films
Ceramics International ( IF 5.1 ) Pub Date : 2021-07-05 , DOI: 10.1016/j.ceramint.2021.07.039
Zhenyu Gao 1 , Zhe Liu 1 , Yunjie Ping 1 , Ziteng Ma 1 , Xu Li 1 , Changwei Wei 2 , Chunqing He 1 , Yong Liu 3
Affiliation  

Elemental doping is the main means to regulate the phase transition of vanadium oxide (VO2); however, the effects of low valence elemental (<4+) doping on the phase transition of VO2 are still controversial. In the present work, Ni-doped VO2 films were prepared on quartz glass by direct current reactive magnetron sputtering and subsequent annealing. With the increase of the Ni doping content, the phase transition temperature of heating (TH) of the VO2 films decreased from 73.4 °C to 52.4 °C. The temperature required for the occurrence of phase transition (Tb) was lower than TMIT. Different from the undoped VO2 film, the Ni-doped VO2 films had a Tb of around 30 °C. XRD and Raman results revealed that some rutile VO2 microcrystals appeared in the vanadium oxide films because of the lattice distortion by incorporated Ni. Hence, rutile VO2 micro-crystallinities significantly facilitated the phase transition of monoclinic VO2 to rutile one.



中文翻译:

Ni掺杂钒氧化物薄膜的低金属-绝缘体转变温度

元素掺杂是调控氧化钒(VO 2)相变的主要手段;然而,低价元素(<4+)掺杂对VO 2相变的影响仍然存在争议。在目前的工作中,通过直流反应磁控溅射和随后的退火在石英玻璃上制备了Ni 掺杂的 VO 2薄膜。随着Ni掺杂量的增加,VO 2薄膜的加热相变温度(T H)从73.4℃降低到52.4℃。发生相变所需的温度(T b)低于T MIT。与未掺杂的 VO 2薄膜不同,Ni 掺杂的 VO2 个薄膜的 T b约为 30°C。XRD 和拉曼结果表明,由于掺入的 Ni 导致晶格畸变,在钒氧化物薄膜中出现了一些金红石 VO 2微晶。因此,金红石VO 2微结晶度显着促进了单斜晶VO 2到金红石一的相变。

更新日期:2021-09-04
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