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Chemical Vapor Deposition of Highly Conjugated, Transparent Boron Carbon Nitride Thin Films
Advanced Science ( IF 15.1 ) Pub Date : 2021-07-03 , DOI: 10.1002/advs.202101602
Paolo Giusto 1 , Daniel Cruz 1 , Tobias Heil 1 , Nadezda Tarakina 1 , Maddalena Patrini 2 , Markus Antonietti 1
Affiliation  

Ternary materials made up only from the lightweight elements boron, carbon, and nitrogen are very attractive due to their tunable properties that can be obtained by changing the relative elemental composition. However, most of the times, the synthesis requires to use up to three different precursor and very high temperatures for the synthesis. Moreover, the low reciprocal solubility of boron nitride and graphene often leads to BN-C composite materials due to phase segregation. Herein, an innovative method is presented to prepare BCN thin films by chemical vapor deposition from a single source precursor, melamine diborate. The deposition occurs homogenously at relatively low temperatures generating very high degree of sp2 conjugation. The as-prepared thin films possess high transparency and refractive index values in the visible range that are of interest for reflective mirrors and lenses. Furthermore, they are wide-bandgap semiconductor with very positive valence band, making these materials very stable against oxidation of interest as protective coating and charge transport layer for solar cells. The simple chemical vapor deposition method that relies on commonly available and low-hazard precursor can open the way for application of BCN thin films in optics, optoelectronics, and beyond.

中文翻译:

高共轭透明硼碳氮化物薄膜的化学气相沉积

仅由轻质元素硼、碳和氮组成的三元材料非常有吸引力,因为它们的可调特性可以通过改变相对元素组成来获得。然而,大多数时候,合成需要使用多达三种不同的前体和非常高的合成温度。此外,氮化硼和石墨烯的互溶度较低,往往会因相偏析而导致BN-C复合材料的出现。在此,提出了一种创新方法,通过化学气相沉积从单源前体二硼酸三聚氰胺制备 BCN 薄膜。沉积在相对较低的温度下均匀地发生,产生非常高程度的sp 2共轭。所制备的薄膜在可见光范围内具有高透明度和折射率值,这对于反射镜和透镜来说很重要。此外,它们是具有非常正价带的宽带隙半导体,使得这些材料对于作为太阳能电池的保护涂层和电荷传输层的氧化非常稳定。这种简单的化学气相沉积方法依赖于常用且低危害的前驱体,可以为 BCN 薄膜在光学、光电子学等领域的应用开辟道路。
更新日期:2021-09-09
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