The deposition temperature and post-deposition heat treatment can be effectively used to fine tune the structure and composition of the films to obtain desired performance. In this paper, we have investigated the effect of elevated substrate temperature and post-deposition annealing (in air and vacuum) on the properties of ZnS films. Both the tools were found to produce considerable changes in the crystal structure of the films. The major impact was found to be an increase in crystallite size which effectively reduced the defects. Although a small amount of tensile stress was produced as a side-effect of heat treatment, the films remained structurally intact. The vacuum annealing was found to be far more productive than annealing in air. It produced nearly the same amount of improvement in the crystallite size, but with considerably less tensile stress. Furthermore, the bandgap of the films remained unaffected by vacuum annealing.

沉积温度和沉积后热处理可以有效地用于微调薄膜的结构和成分，以获得所需的性能。在本文中，我们研究了升高的基板温度和沉积后退火（在空气和真空中）对 ZnS 薄膜性能的影响。发现这两种工具都会在薄膜的晶体结构中产生相当大的变化。发现主要影响是晶粒尺寸的增加，这有效地减少了缺陷。尽管作为热处理的副作用产生了少量的拉伸应力，但薄膜在结构上保持完整。发现真空退火比在空气中退火的效率高得多。它在微晶尺寸方面产生了几乎相同数量的改进，但拉应力要小得多。此外，薄膜的带隙不受真空退火的影响。