A magnetron sputtering discharge with a positively biased anode in argon gas is investigated by Langmuir probe diagnostics and by energy-resolved mass spectrometry. The discharge is operated in continuous (direct current) and in pulsed (high power impulse magnetron sputtering, Hi) mode with a Ti target and in Ar gas. Singly-charged ${\mathrm{Ar}}^{+}$, ${\mathrm{Ti}}^{+}$, and ${\mathrm{Ar}}_2^{+}$ and doubly-charged ${\mathrm{Ar}}^{2+}$ and ${\mathrm{Ti}}^{2+}$ ions are observed. A novel approach is to bias the magnetron anode. Application of a positive anode voltage shifts the kinetic energies of plasma ions by $q{e}_0{V}_a$, where $V_a$ is the anode voltage and $q{e}_0$ is the ion charge. It allows for an effective control of plasma ion energies.

中文翻译：

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带有正偏置阳极的直流和高功率脉冲磁控管溅射放电

通过朗缪尔探针诊断和能量分辨质谱法研究了在氩气中具有正偏置阳极的磁控管溅射放电。放电在连续（直流）和脉冲（高功率脉冲磁控溅射，Hi）模式下使用 Ti 靶和 Ar 气体进行。单独充电${\mathrm{氩气}}^{+}$, ${\mathrm{钛}}^{+}$， 和 ${\mathrm{氩气}}_2^{+}$ 和双重收费 ${\mathrm{氩气}}^{2+}$ 和 ${\mathrm{钛}}^{2+}$观察到离子。一种新颖的方法是偏置磁控管阳极。正阳极电压的应用使等离子体离子的动能移动了$q{\mathrm{电子}}_0{伏}_{\mathrm{一种}}$， 在哪里 ${伏}_{\mathrm{一种}}$ 是阳极电压和 $q{\mathrm{电子}}_0$是离子电荷。它允许有效控制等离子体离子能量。