Thin film encapsulation (TFE) with high barrier performance and mechanical reliability is essential and challenging for flexible organic light-emitting diodes (OLEDs). In this work, SF₆ plasma treatments were introduced for surface modifications of acrylic in Al₂O₃/acrylic laminates fabricated by atomic layer deposition (ALD) and ink-jet printing (IJP). It was found that micro-/nano-structures and surface fluoridation appeared on the surface of acrylic, and could be modulated by the discharge power and irradiation of plasma treatment. The water vapor transmission rates (WVTR) of Al₂O₃/acrylic multi-layers decreased evidently because of reducing surface polarity and strong cross-link of acrylic after plasma treatments. Furthermore, the rugged surface and relieved residual stress resulted from etching and heating of acrylic could enhance the mechanical property remarkably. The plasma treated Al₂O₃/acrylic multi-layers with only 3 dyads exhibited a low WVTR value of 1.02 × 10⁻⁶ g/m²/day and more stable mechanical property under 200 iterations blending test by comparative measurements, proving that the introduction of SF₆ plasma surface modifications could improve simultaneously the barrier performance and mechanical reliability prominently of the inorganic/organic multi-layers with no need of extra neutral axis design.

具有高阻隔性能和机械可靠性的薄膜封装 (TFE) 对于柔性有机发光二极管 (OLED) 而言至关重要且具有挑战性。在这项工作中，SF ₆等离子体处理被引入通过原子层沉积（ALD）和喷墨印刷（IJP）制造的Al ₂ O ₃ /丙烯酸层压板中的丙烯酸表面改性。发现亚克力表面出现微/纳米结构和表面氟化，可以通过放电功率和等离子体处理的辐照进行调节。Al ₂ O _{3 的}水蒸气透过率 (WVTR)由于等离子处理后丙烯酸的表面极性降低和强交联，/丙烯酸多层显着减少。此外，亚克力表面凹凸不平，消除了亚克力蚀刻和加热产生的残余应力，可显着提高其机械性能。通过比较测量，等离子体处理的 Al ₂ O ₃ /丙烯酸多层只有 3 个二元组表现出 1.02 × 10 ^-6  g/m ² /day的低 WVTR 值和更稳定的机械性能，在 200 次迭代共混测试下，证明了SF _{6 的}介绍 等离子体表面改性可以同时显着提高无机/有机多层的阻隔性能和机械可靠性，而无需额外的中性轴设计。