Material properties of transparent conductive oxide (TCO), such as crystallinity and work function, have been recognized as important factors affecting a performance of optoelectronic devices. In this work, a nuclear technique, electron beam irradiation, is proposed as a post deposition technique to alter the material characteristics of an indium tin oxide (ITO) nanorods film. The ITO film is fabricated by ion-assisted electron beam evaporation with glancing-angle deposition (GLAD) technique and subsequently irradiated by an electron beam with energy up to 20 MeV at the absorbed doses of 100 kGy and 300 kGy. The effect of irradiation, in terms of morphology and crystallinity, is studied by scanning electron microscopy (SEM), grazing incidence X-ray diffraction (GIXRD) and transmission electron microscopy (TEM). Whereas, the photoemission spectroscopy (PES) is carried out to study the surface composition and the work function of the ITO films. The SEM result indicates that the diameter of the ITO nanorods increases due to the electron beam irradiation. The electron beam induced crystallization of the ITO nanorod is observed and confirmed by both XRD and TEM measurements. Furthermore, the PES results reveal a change in the surface chemical composition and the work function of the ITO film after the electron beam irradiation. The results of this study implies that the electron beam irradiation serves as a promising post deposition treatment to improve the properties of ITO film, especially in terms of work function alteration.

透明导电氧化物 (TCO) 的材料特性，例如结晶度和功函数，已被认为是影响光电器件性能的重要因素。在这项工作中，提出了一种核技术，即电子束辐射，作为一种后沉积技术，以改变氧化铟锡 (ITO) 纳米棒膜的材料特性。ITO 薄膜是通过离子辅助电子束蒸发和掠射角沉积 (GLAD) 技术制造的，随后用能量高达 20 MeV、吸收剂量为 100 kGy 和 300 kGy 的电子束照射。通过扫描电子显微镜 (SEM)、掠入射 X 射线衍射 (GIXRD) 和透射电子显微镜 (TEM) 研究辐射对形态和结晶度的影响。然而，进行光电发射光谱 (PES) 以研究 ITO 薄膜的表面组成和功函数。SEM 结果表明，由于电子束照射，ITO 纳米棒的直径增加。通过XRD和TEM测量观察并证实了ITO纳米棒的电子束诱导结晶。此外，PES 结果揭示了电子束照射后 ITO 膜的表面化学成分和功函数的变化。这项研究的结果表明，电子束辐照是一种很有前途的沉积后处理，可以改善 ITO 薄膜的性能，尤其是在功函数改变方面。SEM 结果表明，由于电子束照射，ITO 纳米棒的直径增加。通过XRD和TEM测量观察并证实了ITO纳米棒的电子束诱导结晶。此外，PES 结果揭示了电子束照射后 ITO 膜的表面化学成分和功函数的变化。这项研究的结果表明，电子束辐照是一种很有前景的沉积后处理方法，可以改善 ITO 薄膜的性能，尤其是在功函数改变方面。SEM 结果表明，由于电子束照射，ITO 纳米棒的直径增加。通过XRD和TEM测量观察并证实了ITO纳米棒的电子束诱导结晶。此外，PES 结果揭示了电子束照射后 ITO 膜的表面化学成分和功函数的变化。这项研究的结果表明，电子束辐照是一种很有前景的沉积后处理方法，可以改善 ITO 薄膜的性能，尤其是在功函数改变方面。PES 结果揭示了电子束照射后 ITO 膜的表面化学成分和功函数的变化。这项研究的结果表明，电子束辐照是一种很有前景的沉积后处理方法，可以改善 ITO 薄膜的性能，尤其是在功函数改变方面。PES 结果揭示了电子束照射后 ITO 膜的表面化学成分和功函数的变化。这项研究的结果表明，电子束辐照是一种很有前景的沉积后处理方法，可以改善 ITO 薄膜的性能，尤其是在功函数改变方面。